Apparatus, systems and methods for the production of electrodes for use in batteries

ABSTRACT

A process for delineating a population of electrode structures in a web includes laser ablating the web to form ablations in the web, each ablation being formed by removing a portion of an electrochemically active layer to thereby expose a portion of an electrically conductive layer. The process includes forming alignment features in the web that are formed at predetermined locations on the web. The process also includes laser machining the web to form weakened tear patterns in the web that delineate members of the electrode structure population, each of the delineated members being individually bounded, at least in part, by a member of the weakened tear patterns that is adapted to facilitate separation of delineated members, individually, from the web by an application of a force, the alignment features being used to aid in the formation of the weakened tear patterns.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. patent application Ser. No.17/481,697, filed Sep. 22, 2021, which is a continuation ofPCT/US2021/050208, filed Sep. 14, 2021, which claims priority to U.S.Provisional Patent Application No. 63/081,686, filed Sep. 22, 2020, andU.S. Provisional Patent Application No. 63/080,345, filed Sep. 18, 2020.Reference is made to U.S. patent application Ser. No. 16/533,082, filedon Aug. 6, 2019, U.S. patent application Ser. No. 16/763,078, filed May11, 2020, U.S. Provisional Patent application No. 62/586,737, filed Nov.15, 2017, and U.S. Provisional Patent Application No. 62/715,233, filedon Aug. 6, 2018. The contents of each of these applications are herebyincorporated by reference in their entireties.

FIELD

The field of this disclosure relates generally to energy storagetechnology, such as battery technology. More specifically, the field ofthis disclosure relates to systems and methods for the production ofenergy storage systems, such as electrodes for use in batteries,including lithium based batteries.

BACKGROUND

Lithium based secondary batteries have become desirable energy sourcesdue to their comparatively high energy density, power and shelf life.Examples of lithium secondary batteries include non-aqueous batteriessuch as lithium-ion and lithium-polymer batteries.

Known energy storage devices, such as batteries, fuel cells andelectrochemical capacitors, typically have two-dimensional laminararchitectures, such as planar or spirally wound (i.e., jellyroll)laminate structures, where a surface area of each laminate isapproximately equal to its geometric footprint (ignoring porosity andsurface roughness).

FIG. 1 illustrates a cross-sectional view of a known laminar typesecondary battery, indicated generally at 10. The battery 10 includes apositive electrode current collector 15 in contact with a positiveelectrode 20. A negative electrode 25 is separated from the positiveelectrode 20 by a separator layer 30. The negative electrode 25 is incontact with a negative electrode current collector 35. As shown in FIG.1 , the battery 10 is formed in a stack. The stack is sometimes coveredwith another separator layer (not shown) above the negative electrodecurrent collector 35, and then rolled and placed into a can (not shown)to assemble the battery 10. During a charging process, a carrier ion(typically, lithium) leaves the positive electrode 20 and travelsthrough the separator layer 30 into the negative electrode 25. Dependingupon the anode material used, the carrier ion either intercalates (e.g.,sits in a matrix of negative electrode 25 material without forming analloy) or forms an alloy with the negative electrode 25 material. Duringa discharge process, the carrier ion leaves the negative electrode 25and travels back through the separator layer 30 and back into thepositive electrode 20.

Three-dimensional secondary batteries may provide increased capacity andlongevity compared to laminar secondary batteries. The production ofsuch three-dimensional secondary batteries, however, presentsmanufacturing and cost challenges. Precision manufacturing techniquesused, to-date, can yield secondary batteries having improved cycle lifebut at the expense of productivity and cost of manufacturing. When knownmanufacturing techniques are sped up, however, an increased number ofdefects, loss of capacity and reduced longevity of the batteries canresult.

In rocking-chair battery cells, both a positive electrode and a negativeelectrode of a secondary battery comprises materials into which carrierions, such as lithium, inserts and extracts. As the battery isdischarged, carrier ions are extracted from the negative electrode andinserted into the positive electrode. As the battery is charged, thecarrier ions are extracted from the positive electrode and inserted intothe negative electrode.

Silicon has become a promising candidate to replace carbonaceousmaterials as the anode because of its high specific capacity. Forinstance, graphite anodes formed from LiC₆ may have a specific capacityof about 370 milli-amp hours per gram (mAh/g), while crystalline siliconanodes formed from Li₁₅Si₄ may have a specific capacity of about 3600mAh/g, a nearly 10 fold increase over graphite anodes. However, the useof silicon anodes has been limited, due to the large volumetric changes(e.g., 300%) in silicon when Li carrier ions are inserted into siliconanodes. This volumetric increase along with the cracking andpulverization associated with the charge and discharge cycles haslimited the use of silicon anodes in practice. In addition, the use ofsilicon anodes has been limited due to its poor initial columbicefficiency (ICE), which leads to a capacity loss during the initialformation of secondary batteries that utilize silicon anodes.

It is therefore desirable to improve the performance of secondarybatteries that utilize silicon-based anodes, and more specifically, tomitigate the issues that silicon anodes exhibit with respect to theirpoor ICE.

BRIEF DESCRIPTION

In one embodiment, a process for delineating a population of electrodestructures in a web is disclosed. The web has a down-web direction, across-web direction, an electrochemically active layer, and anelectrically conductive layer. The process includes laser machining theweb in at least the cross-web direction to delineate members of thepopulation of electrode structure in the web without releasing thedelineated members from the web and forming an alignment feature in theweb that is adapted for locating each delineated member of the electrodestructure population in the web.

In another embodiment, another process for delineating a population ofelectrode structures in a web is disclosed. The web has a down-webdirection, a cross-web direction, an electrochemically active layer, andan electrically conductive layer. The process includes feeding the webto a cutting station and cutting the web in at least the cross-webdirection at the cutting station to delineate members of the electrodestructure population in the web without releasing the delineated membersfrom the web. The process also includes cutting alignment features inthe web that are adapted for locating each delineated member of theelectrode structure population in the web.

In another embodiment, another process for delineating a population ofelectrode structures in a web is disclosed. The web has a down-webdirection, a cross-web direction, an electrochemically active layer, andan electrically conductive layer. The process includes feeding the webto a laser cutting system, cutting alignment features into the web usingthe laser cutting system and establishing a location of the web using atleast one of the alignment features. The process further includesperforming at least one of a cut action and an ablate action on the webbased on the established location.

In another embodiment, a web comprising an electrochemically activelayer and an electrically conductive layer is disclosed. The web has adelineated population of electrode structures, each electrode structureof the delineated population of electrode structures being spaced froman adjacent electrode structure by a cross-web cut in the web. The webfurther includes alignment features adapted for locating each delineatedelectrode structure of the electrode structure population in the web.

In another embodiment, a web has a delineated population of separatorstructures. Each separator of the delineated population of separators isspaced from an adjacent separator by a cross-web cut in the web. The webfurther includes alignment features adapted for locating each delineatedseparator of the separator population in the web.

In another embodiment, another process for delineating a population ofelectrode structures in a web is disclosed. The web includes anelectrically conductive layer having opposing front and back surfacesand an electrochemically active material layer on the front surface, theback surface, or on both of the front and back surfaces. The web has adown-web direction and a cross-web direction, the down-web and cross-webdirections being orthogonal to each other. The process includes laserablating the web to form a series of ablations in the web that aredisposed in the down-web direction or the cross-web direction, eachablation being formed by removing a portion of the electrochemicallyactive layer to thereby expose a portion of the electrically conductivelayer. The process also includes forming a series of alignment featuresin the web that are disposed in the cross-web or down-web direction, theseries of alignment features being formed at predetermined locations onthe web. The process also includes laser machining the web to form aseries of weakened tear patterns in the web in the down-web direction,the cross-web direction, or each of the cross-web direction and down-webdirection that delineate members of the electrode structure population,each of the delineated members being individually bounded, at least inpart, by a member of the series of weakened tear patterns that isadapted to facilitate separation of delineated members, individually,from the web by an application of a force, the series of alignmentfeatures being used to aid in the formation of the series of weakenedtear patterns.

In another embodiment, another process for delineating a population ofelectrode structures in a web is disclosed. The web includes anelectrically conductive layer having opposing front and back surfacesand an electrochemically active material layer on the front surface, theback surface, or on both of the front and back surfaces. The web has adown-web direction and a cross-web direction, the down-web and cross-webdirections being orthogonal to each other. The process includes movingthe web over a support surface, the support surface comprising athermally conductive material and forming a series of alignment featuresin the web that are disposed in the cross-web or down-web direction. Theprocess also includes laser machining the web to form a series ofweakened tear patterns in the web in the down-web direction, thecross-web direction, or each of the cross-web direction and down-webdirection that delineate members of the electrode structure population,each of the delineated members being individually bounded, at least inpart, by a member of the series of weakened tear patterns that isadapted to facilitate separation of delineated members, individually,from the web by an application of a force, the series of alignmentfeatures being used to aid in the formation of the series of weakenedtear patterns. The process also includes dissipating thermal energy fromthe laser machining using the support surface.

In another embodiment, another process for delineating a population ofelectrode structures in a web is disclosed. The web includes anelectrically conductive layer having opposing front and back surfacesand an electrochemically active material layer on the front surface, theback surface, or on both of the front and back surfaces. The web has adown-web direction and a cross-web direction, the down-web and cross-webdirections being orthogonal to each other. The process includes forminga series of fiducial through-holes in the web that are disposed in thecross-web or down-web direction. The process also includes lasermachining the web form a series of weakened tear patterns in the web inthe down-web direction, the cross-web direction, or each of thecross-web direction and down-web direction that delineate members of theelectrode structure population, wherein the delineated members areindividually bounded, at least in part, by a member of the series ofweakened tear patterns that is adapted to facilitate separation ofdelineated members, individually, from the web by an application of aforce, the series of fiducial through-holes being formed prior to thelaser machining and used to aid in the formation of the series ofweakened tear patterns. The process also includes controlling a tensionin the web in the down-web direction during the laser machining andconveying the web in the down-web direction after the laser machiningwithout releasing the delineated members from the web.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross-section of an existing laminar battery.

FIG. 2 is a schematic diagram of one suitable embodiment of an electrodemanufacturing system according to the present disclosure.

FIG. 3 is an enlarged schematic view of one suitable embodiment of alaser system according to the present disclosure.

FIG. 4 is an isometric view of one suitable embodiment of a cuttingplenum according to the present disclosure.

FIG. 5 is a truncated top view of exemplary webs of base material formedinto electrodes after having been processed through the electrodemanufacturing system of the current disclosure.

FIG. 6 is a top view of an exemplary web of base material havingelectrode patterns formed thereon.

FIG. 6A is a perspective view of a portion of the web of base materialas an exemplary negative electrode.

FIG. 6B is a perspective view of a portion of the web of base materialas an exemplary positive electrode.

FIG. 7 is an enlarged top view of a portion of a web of base materialhaving an exemplary electrode pattern formed thereon.

FIG. 8 is an isometric view of base material formed into a web ofelectrode material including electrode patterns after having beenprocessed through the electrode manufacturing system of the currentdisclosure.

FIG. 8A is a top view of a portion of the web of electrode material ofFIG. 8 .

FIG. 9 is an isometric view of one suitable embodiment of a rewindroller of the electrode manufacturing system of the current disclosure.

FIG. 10 is a top view of one suitable embodiment of a brushing stationof the current disclosure.

FIG. 11 is a side view of the exemplary brushing station shown in FIG.10 .

FIG. 12 is an isometric view of one suitable embodiment of an inspectionstation according to the current disclosure.

FIG. 13 is a top view of a chuck according to one suitable embodiment ofthe current disclosure.

FIG. 14 is a schematic view of a stacking arrangement according to thecurrent disclosure.

FIG. 15 is a cross section of a multi-layer stack of electrodesaccording to the current disclosure.

FIG. 16A is a side view of a multi-layer stack of electrodes accordingto the current disclosure.

FIG. 16B is a partial top view of the multi-layer stack of electrodes ofFIG. 16A.

FIG. 16C is a partial top view of the multi-layer stack of FIG. 16Aafter rupture of a second perforation.

FIG. 17 is an isometric view of a stacked cell according to the currentdisclosure.

FIGS. 18A and 18B are sequential isometric views of a stacked cellhaving a battery package placed thereon.

DEFINITIONS

“A,” “an,” and “the” (i.e., singular forms) as used herein refer toplural referents unless the context clearly dictates otherwise. Forexample, in one instance, reference to “an electrode” includes both asingle electrode and a plurality of similar electrodes.

“About” and “approximately” as used herein refers to plus or minus 10%,5%, or 1% of the value stated. For example, in one instance, about 250um would include 225 μm to 275 μm. By way of further example, in oneinstance, about 1,000 μm would include 900 μm to 1,100 μm. Unlessotherwise indicated, all numbers expressing quantities (e.g.,measurements, and the like) and so forth used in the specification andclaims are to be understood as being modified in all instances by theterm “about.” Accordingly, unless indicated to the contrary, thenumerical parameters set forth in the following specification andattached claims are approximations. Each numerical parameter should atleast be construed in light of the number of reported significant digitsand by applying ordinary rounding techniques.

“Anode” as used herein in the context of a secondary battery refers tothe negative electrode in the secondary battery.

“Anode material” or “Anodically active” as used herein means materialsuitable for use as the negative electrode of a secondary battery.

“Capacity” or “C” as used herein refers to an amount of electric chargethat a battery (or a sub-portion of a battery comprising one or morepairs of electrode structures and counter-electrode structures that forma bilayer) can deliver at a pre-defined voltage unless the contextclearly indicates otherwise.

“Cathode” as used herein in the context of a secondary battery refers tothe positive electrode in the secondary battery.

“Cathode material” or “Cathodically active” as used herein meansmaterial suitable for use as the positive electrode of a secondarybattery.

“Charged state” as used herein in the context of the state of asecondary battery refers to a state where the secondary battery ischarged to at least 75% of its rated capacity unless the context clearlyindicates otherwise. For example, the battery may be charged to at least80% of its rated capacity, at least 90% of its rated capacity, and evenat least 95% of its rated capacity, such as 100% of its rated capacity.

“Composite material” or “Composite” as used herein refers to a materialwhich comprises two or more constituent materials unless the contextclearly indicates otherwise.

“Conversion chemistry active material” or “Conversion chemistrymaterial” refers to a material that undergoes a chemical reaction duringthe charging and discharging cycles of a secondary battery.

“Counter-electrode” as used herein may refer to the negative or positiveelectrode (anode or cathode), opposite of the Electrode, of a secondarybattery unless the context clearly indicates otherwise.

“Counter-electrode current collector” as used herein may refer to thenegative or positive (anode or cathode) current collector, opposite ofthe Electrode current connector, of a secondary battery unless thecontext clearly indicates otherwise.

“Cycle” as used herein in the context of cycling of a secondary batterybetween charged and discharged states refers to charging and/ordischarging a battery to move the battery in a cycle from a first statethat is either a charged or discharged state, to a second state that isthe opposite of the first state (i.e., a charged state if the firststate was discharged, or a discharged state if the first state wascharged), and then moving the battery back to the first state tocomplete the cycle. For example, a single cycle of the secondary batterybetween charged and discharged states can include, as in a charge cycle,charging the battery from a discharged state to a charged state, andthen discharging back to the discharged state, to complete the cycle.The single cycle can also include, as in a discharge cycle, dischargingthe battery from the charged state to the discharged state, and thencharging back to a charged state, to complete the cycle.

“Discharge capacity” as used herein in connection with a negativeelectrode means the quantity of carrier ions available for extractionfrom the negative electrode and insertion into the positive electrodeduring a discharge operation of the battery between a predetermined setof cell end of charge and end of discharge voltage limits unless thecontext clearly indicates otherwise.

“Discharged state” as used herein in the context of the state of asecondary battery refers to a state where the secondary battery isdischarged to less than 25% of its rated capacity unless the contextclearly indicates otherwise. For example, the battery may be dischargedto less than 20% of its rated capacity, such as less than 10% of itsrated capacity, and even less than 5% of its rated capacity, such as 0%of its rated capacity.

“Electrochemically active material” as used herein means anodicallyactive or cathodically active material.

“Electrode” as used herein may refer to the negative or positiveelectrode of a secondary battery unless the context clearly indicatesotherwise.

“Electrode current collector” as used herein may refer to an anode(e.g., negative) current collector or a cathode (e.g., positive) currentcollector.

“Electrode material” as used herein may refer to anode material orcathode material unless the context clearly indicates otherwise.

“Electrode structure” as used herein may refer to an anode structure(e.g., negative electrode structure) or a cathode structure (e.g.,positive electrode structure) adapted for use in a battery unless thecontext clearly indicates otherwise.

“Electrolyte” as used herein refers to a non-metallic liquid, gel, orsolid material in which current is carried by the movement of ionsadapted for use in a battery unless the context clearly indicatesotherwise.

“Longitudinal axis,” “transverse axis,” and “vertical axis,” as usedherein refer to mutually perpendicular axes (i.e., each are orthogonalto one another). For example, the “longitudinal axis,” “transverseaxis,” and the “vertical axis” as used herein are akin to a Cartesiancoordinate system used to define three-dimensional aspects ororientations. As such, the descriptions of elements of the disclosedsubject matter herein are not limited to the particular axis or axesused to describe three-dimensional orientations of the elements.Alternatively stated, the axes may be interchangeable when referring tothree-dimensional aspects of the disclosed subject matter.

“Microstructure” as used herein may refer to the structure of a surfaceof a material revealed by an optical microscope above about 25×magnification unless the context clearly indicates otherwise.

“Microporous” as used herein may refer to a material containing poreswith diameters less than about 2 nanometers unless the context clearlyindicates otherwise.

“Macroporous” as used herein may refer to a material containing poreswith diameters greater than about 50 nanometers unless the contextclearly indicates otherwise.

“Nanoscale” or “Nanoscopic scale” as used herein may refer to structureswith a length scale in the range of about 1 nanometer to about 100nanometers.

“Polymer” as used herein may refer to a substance or material consistingof repeating subunits of macromolecules unless the context clearlyindicates otherwise.

“Reversible coulombic capacity” as used herein in connection with anelectrode (i.e., a positive electrode, a negative electrode or anauxiliary electrode) means the total capacity of the electrode forcarrier ions available for reversible exchange with a counter electrode.

“Void fraction” or “Porosity” or “Void volume fraction” as used hereinrefers to a measurement of the voids (i.e., empty) spaces in a material,and is a fraction of the volume of voids over the total volume of thematerial, between 0 and 1, or as a percentage between 0% and 100%.

“Weakened region” refers to a portion of the web that has undergone aprocessing operation such as scoring, cutting, perforation or the likesuch that the local rupture strength of the weakened region is lowerthan the rupture strength of a non-weakened region.

DETAILED DESCRIPTION

Embodiments of the present disclosure relate to apparatuses, systems andmethods for the production of electrode components for batteries, suchas three-dimensional secondary batteries that improve the speed ofmanufacture of the electrode components, while retaining or improvingbattery capacity and battery longevity, and reducing the occurrences ofdefects during the manufacturing process.

An exemplary system for the production of electrode components,including electrodes and separators, for use in batteries will bedescribed with reference to FIG. 2 . The electrode production (ormanufacturing) system, indicated generally at 100, includes a number ofdiscrete stations, systems, components, or apparatuses that function toenable the efficient production of precision electrodes for use inbatteries. The production system 100 is described first generally, withrespect to FIG. 2 , and subsequently additional detail of each componentis then further described after the broader production system 100 isintroduced.

In the illustrated exemplary embodiment, the production system 100includes a base unwind roller 102 for holding and unwinding a web ofbase material 104. The web of base material 104 may be a web ofelectrode material (i.e., a web of anode material 502 or a web ofcathode material 504), separator material or the like suitable for theproduction of an electrode assembly for a secondary battery. The web ofbase material 104 is a thin sheet of material that has been wound intothe form of a roll, having a center through hole sized for placement onthe base unwind roller 102. In some embodiments, the web of basematerial 104 is a multi-layer material including, for example, anelectrode current collector layer (i.e., an anode current collectorlayer 506 or a cathode current collector layer 510), and anelectrochemically active material layer (i.e., an anodically activematerial layer 508 or a cathodically active material layer 512) on atleast one major surface thereof, and in other embodiments the web ofbase material 104 may be a single layer (e.g., a web of separatormaterial). The base unwind roller 102 may be formed from metal, metalalloy, composite, plastic or any other material that allows theproduction system 100 to function as described herein. In oneembodiment, the base unwind roller 102 is made of stainless steel andhas a diameter of 3 inches (76.2 mm).

As seen in the embodiment of FIG. 2 , the web of base material 104 ispassed across an edge guide 106, to facilitate unwinding of the web ofbase material 104. In one embodiment, the edge guide 106 uses athrough-beam type optical sensor to the position of one edge of the webof base material 104 relative to a fixed reference point. Feedback issent from the edge guide 106 to a “web steering” roller, generally thebase unwind roller 102, which will move in a direction perpendicular tothe direction of travel of the web of base material 104. In thisembodiment, the web of base material 104 then passes around an idler 108a and into a splicing station 110. The idler 108 a (also may be referredto as an idle roller) facilitates maintaining proper positioning andtension of the web of base material 104, as well as to change thedirection of the web of base material 104. In the embodiment shown inFIG. 2 , the idler 108 a receives the web of base material 104 in avertical direction, and is partially wrapped around the idler 108 a suchthat the web of base material 104 leaves the idler 108 a in an outputdirection substantially ninety degrees from the input direction.However, it should be appreciated that the input and output directionsmay vary without departing from the scope of this disclosure. In someembodiments, the production system 100 may use multiple idlers 108 a-108x to change the direction of the web of base material 104 one or moretimes as it is conveyed through the production system 100. The idlers108 a-108 x may be formed from metal, metal alloy, composite, plastic,rubber or any other material that allows the production system 100 tofunction as described herein. In one embodiment, the idlers 108 a-108 xare made of stainless steel and have dimensions of 1 inch (25.4 mm)diameter×18 inches (457.2 mm) length.

The splicing station 110 is configured to facilitate splicing (e.g.,connecting) two separate webs together. In one suitable embodiment, as afirst web of base material 104 is unwound, such that a trailing edge(not shown) of the web of base material 104 is stopped within thesplicing station 110, a leading edge (not shown) of a second web of basematerial 104 is unwound into the splicing station 110 such that thetrailing edge of the first web of base material 104 and the leading edgeof the second web of base material 104 are adjacent one another. Theuser may then apply an adhesive, such as an adhesive tape, to join theleading edge of the second web of base material 104 to the trailing edgeof the first web of base material 104 to form a seam between the twowebs and create a continuous web of base material 104. Such process maybe repeated for numerous webs of base material 104, as dictated by auser. Thus, the splicing station 110 allows for the possibility ofhaving multiple webs of base material being spliced together to form onecontinuous web. It should be appreciated that in other embodiments, auser may splice webs of the same, or different, materials together ifdesired.

In one suitable embodiment, upon exiting the splicing station 110, theweb of base material 104 is then conveyed in the down-web direction WDsuch that it may enter a nip roller 112. The nip roller 112 isconfigured to facilitate controlling the speed at which the web of basematerial 104 is conveyed through the production system 100. In oneembodiment, the nip roller 112 includes at least two adjacent rollers114 having a space therebetween defining a nip. The nip is sized suchthat the web of base material 104 is pressed against each of the twoadjacent rollers 114, with enough pressure to allow friction of therollers to move the web of base material 104, but a low enough pressureto avoid any significant deformation or damage to the web of basematerial 104. In some suitable embodiments, the pressure exerted againstthe web of base material 104 by the at least two adjacent rollers 114 isset between 0 to 210 pounds of force across the cross-web span of theweb S_(w) (i.e., the edge to edge distance of the web in the cross-webdirection XWD) (FIGS. 6, 8A) of base material 104 in the cross-webdirection XWD, such as 0 lb, 5 lb, 10 lb, 15 lb, 20 lb, 25 lb, 30 lb, 35lb, 40 lb, 45 lb, 50 lb, 55 lb, 60 lb, 65 lb, 70 lb, 75 lb, 80 lb, 85lb, 90 lb, 95 lb, 100 lb, 110 lb, 120 lb, 130 lb, 140 lb, 150 lb, 160lb, 170 lb, 180 lb, 190 lb, 200 lb, or 210 lb of force.

In one suitable embodiment, at least one of the adjacent rollers 114 isa compliant roller which may be a high friction roller driven by anelectric motor, and another of the adjacent rollers 114 is a lowfriction passive roller. The compliant roller may have at least anexterior surface made from rubber or polymer capable of providingsufficient grip on the web of base material 104 to provide a pushing orpulling force on the web of base material 104 to convey it through theproduction system 100. In one embodiment, at least one of the adjacentrollers 114 is a steel roller having a diameter of about 3.8 inches,such as 3.863 inches (98.12 mm). In another embodiment, at least one ofthe adjacent rollers 114 is a rubber roller having a diameter of about2.5 inches, such as 2.54 inches (64.51 mm). In yet another embodiment,one or more of the adjacent rollers 114 include a rubber ring placedthereon which may be adjusted for placement at any location along thewidth of the roller, each ring having an outer diameter of about 3.90inches (99.06 mm). It should be appreciated that the diameters of therollers may be less than or greater than such amounts so long as therollers function as described herein. In one embodiment, the rubberrings are placed on the rollers to contact the web of base material 104at a continuous outer edge thereof to drive the web of base material 104in the down-web direction WD. Accordingly, the speed of the web of basematerial 104 is controlled by controlling the rate of rotation of thehigh friction roller via user interface 116. In other embodiments, eachof the adjacent rollers 114 may be made from any high friction or lowfriction material, that allows the production system 100 to function asdescribed herein. It should be appreciated that one or a plurality ofthe adjacent rollers 114 may be connected to a motor (not shown) forcontrolling the speed of the web of base material 104 passing throughthe nip. The production system 100 may include one or more additionalnip rollers 122, 132 to facilitate control of the speed of the web ofbase material 104 conveyed through the production system 100, which maybe controlled via user interface 116. When multiple nip rollers 112,122, and 132 are used, each of the nip rollers 112, 122, and 132 may beset via user interface 116 to the same speed such that the web of basematerial 104 is conveyed smoothly through production system 100.

The production system 100 may also include a dancer 118. As seen in FIG.2 , the illustrated dancer 118 includes a pair of rollers spaced apartfrom one another, but connected about a central axis between the pair ofrollers of the dancer 118. The pair of rollers of the dancer 118 mayrotate about the central axis, thereby passively adjusting the tensionon the web of base material 104. For example, if the tension on the webof base material 104 exceeds a predetermined threshold, the pair ofrollers of the dancer 118 rotate about the central axis to reduce thetension on the web. Accordingly, the dancer 118 may use the mass of thedancer 118 alone (e.g., the mass of one or more of the pair of rollers),a spring, torsion rod or other biasing/tensioning device which may beuser adjustable or controllable via user interface 116, to ensure aproper tension is consistently maintained on the web of base material104. In one embodiment, the mass of the dancer 118 and inertia of thedancer 118 are reduced or minimized to allow for web tension at or below500 gram force, for example by using hollow rollers made of aluminum. Inother embodiments, the rollers of the dancer 118 are made of otherlightweight materials such as carbon fiber, aluminum alloys, magnesium,other lightweight metals and metal alloys, fiberglass or any othersuitable material that allows for a mass low enough to provide a webtension at or below 500 gram force. In yet another embodiment, therollers of the dancer 118 are counterbalanced to allow a tension in theweb of base material 104 of 250 gram force or less.

The production system 100 includes one or more laser systems 120 a, 120b, and 120 c. The embodiment shown in FIG. 2 includes three lasersystems 120 a-c, but it should be appreciated that any number of lasersystems 120 may be used to allow the production system 100 to functionas described herein. Further description of the laser systems 120 a-c ismade with reference to FIG. 3 . In one suitable embodiment, at least oneof the laser systems 120 a-c includes a laser device 300 configured toemit a laser beam 302 toward a cutting plenum 304. In the illustratedembodiment, the cutting plenum 304 includes a chuck 306 and a vacuum308. Details of the chuck 306 are best shown in FIGS. 4 and 13 , furtherdescribed below. In one suitable embodiment, adjacent the laser system120, are one or more inspection devices 310, 312, which may be visualinspection devices such as a camera or any other suitable inspectionsystem which allows the production system 100 to function as furtherdescribed herein.

The exemplary production system 100 illustrated in FIG. 2 includes oneor more cleaning stations such as brushing station 124 and air knife126. Each cleaning station is configured to remove or otherwisefacilitate removal of debris (not shown) from the web of base material104, as described further herein.

The production system 100 of FIG. 2 includes an inspection station 128to identify defects and an associated defect marking system 130 to markthe web of base material 104 to identify locations of identifieddefects, as described further herein.

In one suitable embodiment, the web of base material 104 is rewound viaa rewind roller 134 together with a web of interleaf material 138, whichis unwound via interleaf roller 136 to create a roll of electrodes 140with layers of the electrodes separated by a web of interleaf material138. In some embodiments, the web of base material 104 can be rewoundvia the rewind roller 134 without the web of interleaf material 138.

It should be noted that the series of nip rollers 112, 122, and 132,idlers 108 a-x, and dancers 118 may be together referred to as aconveying system for conveying the web of base material 104 through theproduction system 100. As used herein, a conveying system or conveyingof the web of base material 104 refers to intended movement of the webof base material 104 through the production system 100 in the down-webdirection WD.

With reference to FIG. 5 , the web of base material 104 may be anymaterial suitable for the production of electrode components for use inbatteries as described herein. For example, web of base material 104 maybe an electrically insulating separator material 500, an anode material502 or a cathode material 504. In one suitable embodiment, the web ofbase material 104 is an electrically insulating and ionically permeablepolymeric woven material suitable for use as a separator in a secondarybattery.

In another suitable embodiment, the web of base material 104 is a web ofanode material 502, which may include an anode current collector layer506 and an anodically active material layer 508. In one embodiment, theanode current collector layer 506 comprises a conductive metal such ascopper, copper alloys or any other material suitable as an anode currentcollector layer. The anodically active material layer 508 may be formedas a first layer on a first surface of the anode current collector layer506 and a second layer on a second opposing surface of the anode currentcollector layer 506. In another embodiment, the anode current collectorlayer 506 and anodically active material layer 508 may be intermixed.The first surface and the second opposing surface may be referred to asmajor surfaces, or front and back surfaces, of the web of base material104. A major surface, as used herein, refers to the surfaces defined bythe plane formed by the length of the web of base material 104 in thedown-web direction WD and the span of the web of base material 104 inthe cross web direction XWD.

In general, when the web of base material 104 is a web of anode material502, the anodically active material layer(s) 508 thereof will (each)have a thickness of at least about 10 μm. For example, in oneembodiment, the anodically active material layer(s) 508 will (each) havea thickness of at least about 40 μm. By way of further example, in onesuch embodiment the anodically active material layer(s) 508 will (each)have a thickness of at least about 80 μm. By way of further example, inone such embodiment the anodically active material layers 508 will(each) have a thickness of at least about 120 μm. Typically, however,the anodically active material layer(s) 508 will (each) have a thicknessof less than about 60 μm or even less than about 30 μm.

Exemplary anodically active materials for use as the anodically activematerial layer(s) 508 include carbon materials such as graphite, soft orhard carbons, or graphene (e.g., single-walled or multi-walled carbonnanotubes), or any of a range of metals, semi-metals, alloys, oxides,nitrides and compounds capable of intercalating lithium or forming analloy with lithium. Specific examples of the metals or semi-metalscapable of constituting the anode material 502 include graphite, tin,lead, magnesium, aluminum, boron, gallium, silicon, Si/C composites,Si/graphite blends, silicon oxide (SiO_(x)), porous Si, intermetallic Sialloys, indium, zirconium, germanium, bismuth, cadmium, antimony,silver, zinc, arsenic, hafnium, yttrium, lithium, sodium, graphite,carbon, lithium titanate, palladium, and mixtures thereof. In oneexemplary embodiment, the anodically active material layer 508 comprisesaluminum, tin, or silicon, or an oxide thereof, a nitride thereof, afluoride thereof, or other alloy thereof. In another exemplaryembodiment, the anodically active material layer 508 comprises siliconor an alloy or oxide thereof.

In one embodiment, the anodically active material layer 508 ismicrostructured to provide a significant void volume fraction toaccommodate volume expansion and contraction as lithium ions (or othercarrier ions) are incorporated into or leave the anodically activematerial layer 508 during charging and discharging processes. Ingeneral, the void volume fraction of (each of) the anodically activematerial layer(s) 508 is at least 0.1. Typically, however, the voidvolume fraction of (each of) the anodically active material layer(s) 508is not greater than 0.8. For example, in one embodiment, the void volumefraction of (each of) the anodically active material layer(s) 508 isabout 0.15 to about 0.75. By way of the further example, in oneembodiment, the void volume fraction of (each of) the anodically activematerial layer(s) 508 is about 0.2 to about 0.7. By way of the furtherexample, in one embodiment, the void volume fraction of (each of) theanodically active material layer(s) 508 is about 0.25 to about 0.6.

Depending upon the composition of the microstructured anodically activematerial layer 508 and the method of its formation, the microstructuredanodically active material layer 508 may comprise macroporous,microporous, or mesoporous material layers or a combination thereof,such as a combination of microporous and mesoporous, or a combination ofmesoporous and macroporous. Microporous material is typicallycharacterized by a pore dimension of less than 10 nm, a wall dimensionof less than 10 nm, a pore depth of 1-50 micrometers, and a poremorphology that is generally characterized by a “spongy” and irregularappearance, walls that are not smooth, and branched pores. Mesoporousmaterial is typically characterized by a pore dimension of 10-50 nm, awall dimension of 10-50 nm, a pore depth of 1-100 micrometers, and apore morphology that is generally characterized by branched pores thatare somewhat well defined or dendritic pores. Macroporous material istypically characterized by a pore dimension of greater than 50 nm, awall dimension of greater than 50 nm, a pore depth of 1-500 micrometers,and a pore morphology that may be varied, straight, branched, ordendritic, and smooth or rough-walled. Additionally, the void volume maycomprise open or closed voids, or a combination thereof. In oneembodiment, the void volume comprises open voids, that is, theanodically active material layer 508 contains voids having openings atthe lateral surface of the anodically active material layer 508 throughwhich lithium ions (or other carrier ions) can enter or leave theanodically active material layer 508; for example, lithium ions mayenter the anodically active material layer 508 through the void openingsafter leaving the cathodically active material layer 512. In anotherembodiment, the void volume comprises closed voids, that is, theanodically active material layer 508 contains voids that are enclosedwithin the anodically active material layer 508. In general, open voidscan provide greater interfacial surface area for the carrier ionswhereas closed voids tend to be less susceptible to solid electrolyteinterface while each provides room for expansion of the anodicallyactive material layer 508 upon the entry of carrier ions. In certainembodiments, therefore, it is preferred that the anodically activematerial layer 508 comprise a combination of open and closed voids.

In one embodiment, the anodically active material layer 508 comprisesporous aluminum, tin or silicon or an alloy, an oxide, or a nitridethereof. Porous silicon layers may be formed, for example, byanodization, by etching (e.g., by depositing precious metals such asgold, platinum, silver or gold/palladium on the surface of singlecrystal silicon and etching the surface with a mixture of hydrofluoricacid and hydrogen peroxide), or by other methods known in the art suchas patterned chemical etching. Additionally, the porous anodicallyactive material layer 508 will generally have a porosity fraction of atleast about 0.1, but less than 0.8 and have a thickness of about 1 toabout 100 micrometers. For example, in one embodiment, the anodicallyactive material layer 508 comprises porous silicon, has a thickness ofabout 5 to about 100 micrometers, and has a porosity fraction of about0.15 to about 0.75. By way of further example, in one embodiment, theanodically active material layer 508 comprises porous silicon, has athickness of about 10 to about 80 micrometers, and has a porosityfraction of about 0.15 to about 0.7. By way of further example, in onesuch embodiment, the anodically active material layer 508 comprisesporous silicon, has a thickness of about 20 to about 50 micrometers, andhas a porosity fraction of about 0.25 to about 0.6. By way of furtherexample, in one embodiment, the anodically active material layer 508comprises a porous silicon alloy (such as nickel silicide), has athickness of about 5 to about 100 micrometers, and has a porosityfraction of about 0.15 to about 0.75.

In another embodiment, the anodically active material layer 508comprises fibers of aluminum, tin or silicon, or an alloy thereof.Individual fibers may have a diameter (thickness dimension) of about 5nm to about 10,000 nm and a length generally corresponding to thethickness of the anodically active material layer 508. Fibers(nanowires) of silicon may be formed, for example, by chemical vapordeposition or other techniques known in the art such as vapor liquidsolid (VLS) growth and solid liquid solid (SLS) growth. Additionally,the anodically active material layer 508 will generally have a porosityfraction of at least about 0.1, but less than 0.8 and have a thicknessof about 1 to about 200 micrometers. For example, in one embodiment, theanodically active material layer 508 comprises silicon nanowires, has athickness of about 5 to about 100 micrometers, and has a porosityfraction of about 0.15 to about 0.75. By way of further example, in oneembodiment, the anodically active material layer 508 comprises siliconnanowires, has a thickness of about 10 to about 80 micrometers, and hasa porosity fraction of about 0.15 to about 0.7. By way of furtherexample, in one such embodiment, the anodically active material layer508 comprises silicon nanowires, has a thickness of about 20 to about 50micrometers, and has a porosity fraction of about 0.25 to about 0.6. Byway of further example, in one embodiment, the anodically activematerial layer 508 comprises nanowires of a silicon alloy (such asnickel silicide), has a thickness of about 5 to about 100 micrometers,and has a porosity fraction of about 0.15 to about 0.75.

In general, the anode current collector layer 506 will have anelectrical conductivity of at least about 10³ Siemens/cm. For example,in one such embodiment, the anode current collector layer 506 will havea conductivity of at least about 10⁴ Siemens/cm. By way of furtherexample, in one such embodiment, the anode current collector layer 506will have a conductivity of at least about 10⁵ Siemens/cm. Exemplaryelectrically conductive materials suitable for use as anode currentcollector layers 506 include metals, such as, copper, nickel, cobalt,titanium, and tungsten, and alloys thereof.

Referring again to FIG. 5 , in another suitable embodiment, the web ofbase material 104 is a web of cathode material 504, which may include acathode current collector layer 510 and a cathodically active materiallayer 512. The cathode current collector layer 510 of the cathodematerial 504 may comprise aluminum, an aluminum alloy, titanium or anyother material suitable for use as a cathode current collector layer510. The cathodically active material layer 512 may be formed as a firstlayer on a first surface of the cathode current collector layer 510 anda second layer on a second opposing surface of the cathode currentcollector layer 510. The cathodically active material layer 512 may becoated onto one or both sides of cathode current collector layer 510.Similarly, the cathodically active material layer 512 may be coated ontoone or both major surfaces of cathode current collector layer 510. Inanother embodiment, the cathode current collector layer 510 may beintermixed with cathodically active material layer 512.

In general, when the web of base material 104 is a web of cathodematerial 504, the cathodically active material layer(s) 512 thereof will(each) have a thickness of at least about 20 μm. For example, in oneembodiment, the cathodically active material layer(s) 512 will (each)have a thickness of at least about 40 μm. By way of further example, inone such embodiment the cathodically active material layer(s) 512 will(each) have a thickness of at least about 60 μm. By way of furtherexample, in one such embodiment the cathodically active materiallayer(s) 512 will (each) have a thickness of at least about 100 μm.Typically, however, the cathodically active material layer(s) 512 will(each) have a thickness of less than about 90 μm or even less than about70 μm.

Exemplary cathodically active materials include any of a wide range ofcathodically active materials. For example, for a lithium-ion battery,the cathodically active material layer 512 may comprise a cathodicallyactive material selected from transition metal oxides, transition metalsulfides, transition metal nitrides, lithium-transition metal oxides,lithium-transition metal sulfides, and lithium-transition metal nitridesmay be selectively used. The transition metal elements of thesetransition metal oxides, transition metal sulfides, and transition metalnitrides can include metal elements having a d-shell or f-shell.Specific examples of such metal element are Sc, Y, lanthanoids,actinoids, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co,Rh, Ir, Ni, Pb, Pt, Cu, Ag, and Au. Additional cathodically activematerials include LiCoO₂, LiNi_(0.5)Mn_(1.5)O₄,Li(Ni_(x)Co_(y)Al_(z))O₂, LiFePO₄, Li₂MnO₄, V₂O₅, molybdenumoxysulfides, phosphates, silicates, vanadates, sulfur, sulfur compounds,oxygen (air), Li(Ni_(x)Mn_(y)Co_(z))O₂, and combinations thereof.

In general, the cathode current conductor layer 510 will have anelectrical conductivity of at least about 10³ Siemens/cm. For example,in one such embodiment, the cathode current conductor layer 510 willhave a conductivity of at least about 10⁴ Siemens/cm. By way of furtherexample, in one such embodiment, the cathode current conductor layer 510will have a conductivity of at least about 10⁵ Siemens/cm. Exemplarycathode current conductor layers 510 include metals, such as aluminum,nickel, cobalt, titanium, and tungsten, and alloys thereof.

Referring again to FIG. 5 , in another suitable embodiment, the web ofbase material 104 is a web of electrically insulating but ionicallypermeable separator material. Electrically insulating separatormaterials 500 are adapted to electrically isolate each member of theanode population from each member of the cathode population of asecondary battery. Electrically insulating separator material 500 willtypically include a microporous separator material that can be permeatedwith a non-aqueous electrolyte; for example, in one embodiment, themicroporous separator material includes pores having a diameter of atleast 50 Å, more typically in the range of about 2,500 Å, and a porosityin the range of about 25% to about 75%, more typically in the range ofabout 35-55%

In general, when the web of base material 104 is a web of electricallyinsulating separator material 500, the electrically insulating separatormaterial 500 will have a thickness of at least about 4 μm. For example,in one embodiment, the electrically insulating separator material 500will have a thickness of at least about 8 μm. By way of further example,in one such embodiment the electrically insulating separator material500 will have a thickness of at least about 12 μm. By way of furtherexample, in one such embodiment the electrically insulating separatormaterial 500 will have a thickness of at least about 15 μm. Typically,however, the electrically insulating separator material 500 will have athickness of less than about 12 μm or even less than about 10 μm.

In one embodiment, the microporous separator material comprises aparticulate material and a binder, and has a porosity (void fraction) ofat least about 20 vol. % The pores of the microporous separator materialwill have a diameter of at least 50 Å and will typically fall within therange of about 250 to 2,500 Å. The microporous separator material willtypically have a porosity of less than about 75 vol %. In oneembodiment, the microporous separator material has a porosity (voidfraction) of at least about 25 vol %. In one embodiment, the microporousseparator material will have a porosity of about 35-55 vol %.

The binder for the microporous separator material may be selected from awide range of inorganic or polymeric materials. For example, in oneembodiment, the binder is an organic material selected from the groupconsisting of silicates, phosphates, aluminates, aluminosilicates, andhydroxides such as magnesium hydroxide, calcium hydroxide, etc. Forexample, in one embodiment, the binder is a fluoropolymer derived frommonomers containing vinylidene fluoride, hexafluoropropylene,tetrafluoropropene, and the like. In another embodiment, the binder is apolyolefin such as polyethylene, polypropylene, or polybutene, havingany of a range of varying molecular weights and densities. In anotherembodiment, the binder is selected from the group consisting ofethylene-diene-propene terpolymer, polystyrene, polymethyl methacrylate,polyethylene glycol, polyvinyl acetate, polyvinyl butyral, polyacetal,and polyethyleneglycol diacrylate. In another embodiment, the binder isselected from the group consisting of methyl cellulose, carboxymethylcellulose, styrene rubber, butadiene rubber, styrene-butadiene rubber,isoprene rubber, polyacrylamide, polyvinyl ether, polyacrylic acid,polymethacrylic acid, and polyethylene oxide. In another embodiment, thebinder is selected from the group consisting of acrylates, styrenes,epoxies, and silicones. In another embodiment, the binder is a copolymeror blend of two or more of the aforementioned polymers.

The particulate material comprised by the microporous separator materialmay also be selected from a wide range of materials. In general, suchmaterials have a relatively low electronic and ionic conductivity atoperating temperatures and do not corrode under the operating voltagesof the battery electrode or current collector contacting the microporousseparator material. For example, in one embodiment, the particulatematerial has a conductivity for carrier ions (e.g., lithium) of lessthan 1×10⁻⁴ S/cm. By way of further example, in one embodiment, theparticulate material has a conductivity for carrier ions of less than1×10⁻⁵ S/cm. By way of further example, in one embodiment, theparticulate material has a conductivity for carrier ions of less than1×10⁻⁶ S/cm. Exemplary particulate materials include particulatepolyethylene, polypropylene, a TiO₂-polymer composite, silica aerogel,fumed silica, silica gel, silica hydrogel, silica xerogel, silica sol,colloidal silica, alumina, titania, magnesia, kaolin, talc, diatomaceousearth, calcium silicate, aluminum silicate, calcium carbonate, magnesiumcarbonate, or a combination thereof. For example, in one embodiment, theparticulate material comprises a particulate oxide or nitride such asTiO₂, SiO₂, Al₂O₃, GeO₂, B₂O₃, Bi₂O₃, BaO, ZnO, ZrO₂, BN, Si₃N₄, Ge₃N₄.See, for example, P. Arora and J. Zhang, “Battery Separators” ChemicalReviews 2004, 104, 4419-4462. In one embodiment, the particulatematerial will have an average particle size of about 20 nm to 2micrometers, more typically 200 nm to 1.5 micrometers. In oneembodiment, the particulate material will have an average particle sizeof about 500 nm to 1 micrometer.

In an alternative embodiment, the particulate material comprised by themicroporous separator material may be bound by techniques such assintering, binding, curing, etc. while maintaining the void fractiondesired for electrolyte ingress to provide the ionic conductivity forthe functioning of the battery.

In an assembled energy storage device, the microporous separatormaterial is permeated with a non-aqueous electrolyte suitable for use asa secondary battery electrolyte. Typically, the non-aqueous electrolytecomprises a lithium salt and/or mixture of salts dissolved in an organicsolvent and/or solvent mixture. Exemplary lithium salts includeinorganic lithium salts such as LiClO₄, LiBF₄, LiPF₆, LiAsF₆, LiCl, andLiBr; and organic lithium salts such as LiB(C₆H₅)₄, LiN(SO₂CF₃)₂,LiN(SO₂CF₃)₃, LiNSO₂CF₃, LiNSO₂CF₅, LiNSO₂C₄F₉, LiNSO₂C₅F₁₁,LiNSO₂C₆Fi₃, and LiNSO₂C₇F₁₅. Exemplary organic solvents to dissolve thelithium salt include cyclic esters, chain esters, cyclic ethers, andchain ethers. Specific examples of the cyclic esters include propylenecarbonate, butylene carbonate, γ-butyrolactone, vinylene carbonate,2-methyl-γ-butyrolactone, acetyl-γ-butyrolactone, and γ-valerolactone.Specific examples of the chain esters include dimethyl carbonate,diethyl carbonate, dibutyl carbonate, dipropyl carbonate, methyl ethylcarbonate, methyl butyl carbonate, methyl propyl carbonate, ethyl butylcarbonate, ethyl propyl carbonate, butyl propyl carbonate, alkylpropionates, dialkyl malonates, and alkyl acetates. Specific examples ofthe cyclic ethers include tetrahydrofuran, alkyltetrahydrofurans,dialkyltetrahydrofurans, alkoxytetrahydrofurans,dialkoxytetrahydrofurans, 1,3-dioxolane, alkyl-1,3-dioxolanes, and1,4-dioxolane. Specific examples of the chain ethers include1,2-dimethoxyethane, 1,2-diethoxythane, diethyl ether, ethylene glycoldialkyl ethers, diethylene glycol dialkyl ethers, triethylene glycoldialkyl ethers, and tetraethylene glycol dialkyl ethers.

In yet other embodiments, the web of base material 104 may be anymaterial suitable for the production of electrode components for use insolid state secondary batteries, such as those described in U.S. Pat.No. 9,553,332, issued Jan. 24, 2017, which is hereby incorporated byreference in its entirety. For example, in some embodiments, the web ofbase material 104 may comprise an electrode current collector material,such as a negative electrode current collector or positive electrodecurrent collector material. The electrode current collector material, insome embodiments, may comprise copper, nickel, nickel-coated copper,iron-coated copper, copper-coated aluminum, aluminum, titanium,stainless steel, or other materials known not to alloy with lithium andconfigured to function as an anode current collector. In anotherembodiment, the web of base material 104 is a positive electrode currentcollector material comprising aluminum, aluminum foil, carbon-coatedaluminum foil. In such embodiments, the electrode current collectormaterial may be a metal coating as opposed to being a foil, created withstandard routes such as electroplating, electroless plating, PVD, metalnanoparticle sintering, and/or sol-gel with post-reduction.

In another embodiment, for example for solid state secondary batteries,the web of base material 104 may comprise a solid state electrolytematerial, such as those described in such as those described in U.S.Pat. No. 9,553,332, referenced above. In this embodiment, the web ofbase material 104 may comprise a fast lithium ion conductor with aconductivity of greater than 10⁻⁵ S/cm, such as garnet, LiPON,antiperovskite, LISICON, thio-LISICON, sulfide, oxysulfide, polymer,composite polymer, ionic liquid, gel, or organic liquid. The electrolytehas a thickness ranging from about 0.1 μm to about 40 μm, but includesvariations. In some examples, the electrolyte thickness is 25 μm, i.e.,25 microns. In some examples, the electrolyte thickness is 25 μm orless, i.e., 25 microns or less.

In another embodiment, for example for solid state secondary batteries,the web of base material 104 may comprise a catholyte material, such asthose described in such as those described in U.S. Pat. No. 9,553,332,referenced above. In this embodiment, the web of base material 104comprises a catholyte material comprising a lithium, germanium,phosphorous, and sulfur (“LGPS”) containing material or a lithium,silicon, phosphorous, and sulfur (“LSPS”) containing material, each ofwhich is configured in a polycrystalline or amorphous state. In thisembodiment, the catholyte material has an ion conductivity greater than10⁻⁴ S/cm and preferably greater than 10⁻³ S/cm. In one embodiment, thecatholyte material has a particle size that is smaller than an activeregion particle size. For example, the median catholyte particle in someembodiments has a diameter three times or more smaller than the medianactive particle size. The catholyte material may alternately beconfigured in a core-shell structure as a coating around the cathodeactive material. In a further variation, the catholyte material may beconfigured as nanorods or nanowires. In this embodiment, the web of basematerial 104 may also include a cathode electronically conductingspecies such as carbon, activated carbon, carbon black, carbon fibers,carbon nanotubes, graphite, graphene, fullerenes, metal nanowires, superP, and other materials known in the art. The cathode region furthercomprises a binder material to improve the adhesion of the cathode tothe substrate and the cohesion of the cathode to itself during cycling.In an embodiment, the catholyte material has an oxygen speciesconfigured within the LGPS or LSPS containing material. In anotherembodiment, the oxygen species has a ratio to the sulfur species of 1:2and less to form a LGPSO material or LSPSO material. In an example, theoxygen species is less than 20 percent of the LGPSO material.

In yet other embodiments, the web of base material 104 may be suitablefor the production of electrode components for use in solid statesecondary batteries, such as those described in U.S. Pat. No. 9,553,33,referenced above wherein the catholyte material is characterized as asolid. In this embodiment, the catholyte material has a substantiallyfixed compound structure, which behaves like a solid rather than afluid. In one embodiment, the solid catholyte material is fabricated byphysical vapor deposition (PVD), chemical vapor deposition (CVD), atomiclayer deposition (ALD), and solid state reaction of powders, mechanicalmilling of powders, solution synthesis, evaporation, or any combinationthereof. In another embodiment, the catholyte material is mixed with theactive material in a mixer or mill or with different configurations ofphysical vapor deposition, optionally mixed with carbon, and coated ontoa substrate by gravure, comma coating, meyer rod coating, doctorblading, slot die coating, or with a conventional technique. In anotherembodiment, the catholyte material is coated directly on cathode activematerial with a vapor phase growth, mechanofusion, liquid phase growth,deposition on particles in a fluidized bed or rotary reactor, orcombinations thereof, or the like. In another embodiment, the web ofbase material 104 comprises a polymer material comprising a lithiumspecies. The polymer material may be formed overlying the catholytematerial. The polymer material in some embodiments is polyacrylonitrile,poly-ethylene oxide, PvDF, PvDF-HFP, rubbers like butadiene rubber andstyrene butadiene rubber, among others.

In one embodiment, web of base material 104 may have an adhesive tapelayer (not shown) adhered to one or both surfaces of the anodicallyactive material layer 508, or cathodically active material layer 512,respectively. The adhesive layer may then later be removed subsequent toablation and cutting (described below) to remove unwanted material ordebris.

Embodiments of the laser systems 120 a-c are further described withreference to FIGS. 2-6 . The web of base material 104 enters the lasersystem 120 in the down-web direction WD. In one embodiment, the web ofbase material 104 enters the laser system 120 a in a first condition400, having not yet been ablated or cut. Accordingly, the web of basematerial 104 in the first condition 400 should have substantially nodefects or alterations from an initial state. The web of base material104 passes over chuck 306, which includes a plurality of vacuum holes406. The vacuum holes 406 are in fluid connection with vacuum 308, todraw a vacuum pressure on the web of base material 104 passing over thevacuum holes 406. The vacuum holes 406 may be staggered and/or bechamfered to allow the web of base material 104 to more easily passthereover without snagging. The cross-sectional area of the holes mustbe small enough to prevent the web of base material 104 from being drawntherein, but large enough to allow proper airflow from the vacuumtherethrough. The vacuum pressure facilitates maintaining the web ofbase material 104 in a substantially flat/planar state as it is conveyedacross chuck 306. In some suitable embodiments, the laser system 120 issensitive to focus, and in such embodiments it is critical to keep theweb of base material 104 at a substantially constant distance, forexample from +/−100 microns of a predetermined position, from laseroutput 313, to ensure laser beam 302 is in focus when contacting the webof base material 104 during cutting or ablating processes. Accordingly,the vacuum pressure through vacuum holes 406 may be monitored andadjusted in real time, for example via user interface 116, to ensurethat the web of base material 104 remains substantially flat acrosschuck 306 and does not lift or buckle while being processed. Thecross-sectional shape of the vacuum holes 406 may be circular, square,rectangular, oval or any other shape that allows the chuck 306 tofunction as described herein.

As seen in FIG. 4 , the chuck 306 (e.g., support surface) includes anopening 410 defined by an upstream edge 412 and the downstream edge 414.The illustrated chuck 306 includes a chamfer 416 on the downstream edge414. In this embodiment, the chamfer 416 facilitates the web of basematerial 104 passing over downstream edge 414 without having the web ofbase material 104 catch or snag on the downstream edge 414. The angle αof the chamfer 416 may be between 1 degree and 90 degrees, such as 5degrees, 10 degrees, 15 degrees, 20 degrees, 25 degrees, 30 degrees, 35degrees, 40 degrees, 45 degrees, 50 degrees, 55 degrees, 60 degrees, 65degrees, 70 degrees, 75 degrees, 80 degrees, 85 degrees or any otherangle that allows chamfer 416 to function as describes herein. It theillustrated embodiment, for example, the angle α is approximately 25degrees. It has been found that performance is improved if the angle αof the chamfer 416 is greater than the deflection of the web of basematerial 104 passing over the chamfer 416. Upper edge 418 of chamfer 416may be radiused to provide a smooth transition from the chamfer 416 tothe surface of the chuck 306.

In one suitable embodiment, the chuck 306 is formed from aluminum.However, the chuck 306 may be formed from aluminum alloy, composites,metals or metal alloys or any other suitable material that allows chuck306 to function as described herein. In one embodiment, the material ofthe chuck 306, such as aluminum, facilitates heat dissipation from theweb during laser machining.

In one suitable embodiment, the web of base material 104 is firstablated by laser beam 302 (FIG. 3 ) to create the ablations 404 (FIG. 4) in the web of base material 104 such that it is in a second condition402 after being ablated by laser beam 302. In one embodiment, the web ofbase material 104 is anode material 502, and the ablations 404 removethe anodically active material layer 508 to expose anode currentcollector layer 506 (FIG. 5 ). In another embodiment, the web of basematerial 104 is cathode material 504, and the ablations 404 remove thecathodically active material layer 512 to expose cathode currentconductor layer 510. In one embodiment, the ablations 404 are configuredas electrode tabs (adapted to electrically connect the cathode currentcollector layer 510 and the anode current collector layer 506 to thepositive and negative terminals, respectively, of a secondary battery).When using the laser system 120 a to make the ablations 404 in the webof base material 104, the power of the laser beam 302 is set to a levelthat is capable of substantially completely, or completely, removing thecoating layer, but will not damage or cut through the current collectorlayer. In use, the laser beam 302 is controlled, for example via userinterface 116, to create the ablations 404 while the web of basematerial 104 is in motion and being conveyed in down-web direction WD.The ablations 404 are created on each side of the web of base material104, as best shown in FIG. 5 . In one embodiment, after making theablations 404, the laser system 120 a forms fiducial features 602, asdescribed further herein. In another embodiment, multiple laser systems120 a may be used to each ablate a portion of the web of base material104 to each create one or more ablations 404 to increase the throughputof the production system 100.

With further reference to FIGS. 2, 3 and 4 , in another stage of theproduction system, the web of material 104 is conveyed in the down-webdirection WD toward a cutting area 408 of the laser system 120 a. Thecutting area 408 includes the opening 410 of chuck 306. In oneembodiment, the opening 410 is in fluid communication with the vacuum308, to draw a vacuum pressure on the web of base material 104 passingover the opening 410. In one suitable embodiment, the opening 410 iswider in a cross-web direction XWD than the web of base material 104,such that an entire width of the web of base material 104 in thecross-web direction XWD is suspended over the opening 410. In oneembodiment, there may be a second vacuum, configured to equalize thepressure on the web of base material 104 opposite the chuck 306. In thisembodiment, the equalization in pressure facilitates maintaining the webof base material 104 in a substantially flat/planar state and at aconsistent height when passing over the opening 410, which facilitatesmaintaining focus of laser beam 302 on the web of base material 104. Inone embodiment, a carrier web may be used to support the web of basematerial 104. In some embodiments, the carrier web is removably attachedto the web of base material 104 using a low tack adhesive orelectrostatic pinning. In such embodiments, the attachment hassufficient adhesion to remain attached to the web of base material 104during processing but is removable without causing damage to the web ofbase material 104. In one embodiment, the carrier web is a material thatdoes not absorb the laser wavelength being used during processing of theweb of base material 104, such that the carrier web will not be cutthrough, vaporized or ablated, and accordingly may be reused on otherwebs of base material 104.

The laser system 120 a is configured to cut one or more patterns (suchas individual electrode patterns 800 (FIG. 8 ), which may also bereferred to as an electrode tear pattern or weakened tear pattern), todelineate each member of a population of electrode structures, in theweb of base material 104 while the web of base material 104 is over theopening 410. In one embodiment, there may be a plurality of openings410, for which one or more of the electrode patterns 800 are cut whilethe web of base material 104 is over the respective one o With referenceto FIG. 6 , the patterns may include one or more lengthwise edge cuts600 that define lengthwise edges of an electrode in the cross-webdirection XWD. The lengthwise edge cuts 600 are cut using laser beam 302cutting the web of base material 104 in the cross-web direction XWDwhile the web of base material 104 is conveyed in the down-web directionWD. The cross-web direction XWD is orthogonal to the down-web directionWD. It should be noted that, in one embodiment, in order to createlengthwise edge cuts 600 that are substantially perpendicular to thedown-web direction WD, the laser beam 302 must be controlled to travelat an angle with respect to the down-web direction WD, to account forthe movement of the web of base material 104 in the down-web directionWD. For example, as the web of base material 104 moves in the down-webdirection WD, the path of the laser beam 302 is projected onto the webof base material 104 at an initial cut location 604, and then issynchronized with the motion of the web of base material 104 in the webdirection. Accordingly, the path of laser beam 302 is controlled totravel in both the cross-web direction XWD and the down-web direction WDuntil reaching end cut location 606 to create the lengthwise edge cuts600. In this embodiment, a compensation factor is applied to the path ofthe laser beam 302 to allow cuts to be made in the cross-web directionXWD while the web of base material 104 is continuously traveling in thedown-web direction WD. It should be appreciated that the angle at whichthe laser beam 302 travels varies based upon the speed of the web ofbase material 104 in the down-web direction WD. In another embodiment,the web of base material 104 is temporarily stopped during the laserprocessing operation, and as such, the path of the laser beam 302 doesnot need to account for the motion of the travel of the web of basematerial 104 in the down-web direction WD. Such embodiment may bereferred to as a step process, or step and repeat process. During laserprocessing, one or more of the laser systems 120 a-c use a repeatingalignment feature, such as fiducial features 602 to adjust/align thelaser beam 302 during the laser processing operations, for example tocompensate for possible variations in positioning of the web of basematerial 104.

It should be appreciated that, although the laser processing operationsas described herein such that the lengthwise edge cuts 600 are definedin the cross-web direction XWD, such that repeating patterns ofindividual electrode patterns 800 are aligned in the cross-web directionXWD, in other embodiments, the laser processing operations describedherein can be controlled such that the lengthwise edge cuts 600, and allassociated cuts, perforations and ablation operations are orientedrespectively perpendicular. For example, lengthwise edge cuts 600 can bealigned in the down-web direction WD, such that populations ofindividual electrode patterns 800 are aligned in the down-web directionWD, rather than the cross-web direction XWD.

In one embodiment, laser system 120 a cuts a tie bar 614 between one ormore of the individual electrode patterns 800. The tie bar 614 may beused to delineate between groups of the individual electrode patterns800. For example, in the embodiment shown in FIG. 6 , a tie bar 614 iscut between groups of five individual electrode patterns 800. However,in other embodiments the tie bar 614 may be included after any number ofindividual electrode patterns 800, or not present at all. The tie bar614 is defined by an upstream and downstream tie bar edge cut 616, 618respectively. In some embodiments, the tie bar 614 is sized to provideadditional structural stiffness to the web of base material 104 duringprocessing.

In addition, in one suitable embodiment, the laser system 120 a cuts oneor more of the repeating alignment features such as a plurality of thefiducial features 602 in the web of base material 104. In oneembodiment, the fiducial features 602 are fiducial through-holes. Thefiducial features 602 are cut at a known location on the web of basematerial 104. The fiducial features 602 are shown as circular in FIG. 6, but may be rectangular as shown in FIG. 8 , or any size or shape thatallows the production system 100 to function as described herein. Thefiducial features 602 are tracked by one or more of visual inspectiondevices 310, 312 which measures the location and speed of travel of thefiducial features 602. The measurement of the fiducial features 602 isthen used to accurately allow for front to back alignment of thepatterns on the web of base material 104 in both the down-web directionWD and cross-web direction XWD. The laser system 120 a may also cut aplurality of tractor holes 612 that may be used for alignment of the webof base material 104, or may be used as holes that engage with a gearwheel 1210 (FIG. 12 ) for positioning and tension control of the web ofbase material 104. Tractor holes 612 may be circular, square or anyother shape that allows the production system 100 to function asdescribed herein. In another suitable embodiments, the web of basematerial 104 has the plurality of tractor holes 612 and/or fiducialfeatures 602 pre-cut therein prior to being unwound and conveyed throughproduction system 100. In one embodiment, there is a one-to-one ratio offiducial features 602 to individual electrode patterns 800. In otherembodiments, there may be two or more fiducial features 602 per eachindividual electrode pattern 800.

With reference to FIGS. 2 and 6 , in one suitable embodiment, the lasersystem 120 a cuts a first perforation 608 and a second perforation 610in the web of base material 104 as part of the individual electrodepattern 800. The first perforation 608 may also be referred to as the“outer perforation” because it lies at the outside of the individualelectrode pattern 800 in the cross-web direction XWD, and the secondperforation 610 may also be referred to as the “inner perforation”because it lies inboard of the outer perforation 608 in the cross-webdirection XWD. The perforations 608, 610 are best shown in FIG. 7 ,which is an enlarged view of the portion 613 (FIG. 5 ) of web of basematerial 104. First perforation 608 is formed by laser cutting usinglaser beam 302, while the web of base material 104 is positioned overthe opening 410 in chuck 306. The first perforation 608 is formed as alinear slit (e.g., through-cut) in a direction aligned with the down-webdirection WD. Importantly, the first perforation 608 does not extendacross the entirety of the width of the electrode W_(e). Instead, outertear strips 700 remain on both the upstream and downstream edges of thefirst perforation 608, to ensure the individual electrode pattern 800remains connected to the web of base material 104.

Similarly, with further reference to FIGS. 6 and 7 , the secondperforations 610 are formed inboard (in the cross-web direction XWD)from the first perforations 608. In one suitable embodiment, the secondperforations 610 are formed as a line of slits in the down-web directionWD separated by inner tear strips 702. In the embodiment shown, thesecond perforations 610 intersect through holes 704. In the illustratedembodiment, the inner tear strips 702 are at least two times the lengthof outer tear strips 700, such that the rupture force required toseparate the outer tear strips 700 is approximately half of the ruptureforce required to separate inner tear strips 702 from the web of basematerial 104. In other embodiments, the ratio of the rupture strength ofthe outer and inner tear strips 700 and 702, respectively, may vary, butis preferred that the outer tear strips 700 have a rupture strengthlower than the inner tear strips 702, such that upon application of atensile, or shear, force applied to the edges of the web of basematerial 104, that the outer tear strips 700 will rupture before innertear strips 702.

With reference to FIGS. 3, 4 and 6 , by performing the laser cuts forthe lengthwise edge cuts 600, the fiducial features 602, and the firstand second perforations 608, 610 over the opening 410 of the chuck 306,it allows debris to fall through the opening 410 and also allows thevacuum 308 to collect debris formed during the laser cutting process.

In one suitable embodiment, the laser system 120 a is configured as afirst ablation station. In this embodiment, the laser system 120 a formsthe ablations 404, as described above on a first surface of the web ofbase material 104. Upon exiting laser system 120 a, the web of basematerial 104 passes over idler 108 d which flips the web of basematerial 104 in a manner such that a second surface (opposing the firstsurface) of the web of base material 104 is positioned for processing bythe laser system 120 b, which is configured as a second ablation stationin this embodiment. In this embodiment, the laser system 120 b isconfigured to use the fiducial features 602 to ensure alignment in thedown-web direction WD and cross-web direction XWD. Accordingly, thelaser system 120 b performs a second ablation process on the opposingsurface of the web of base material 104, such that ablations 404 on eachsurface of the web of base material 104 are aligned in the down-webdirection WD and the cross-web direction XWD. In one embodiment, theablations 404 are configured as current collector tabs of theelectrodes.

In one embodiment, the laser system 120 c seen in FIG. 2 is configuredas a laser cutting station. In this embodiment, the laser system 120 cperforms the laser cuts such as lengthwise edge cuts 600, and the firstand second perforations 608 and 610.

In one suitable embodiment, one or more of the laser devices 300 of thelaser systems 120 a-c is a 20-watt fiber laser. In embodiments, suitablelaser devices 300 of the laser systems 120 a-c have a laser power withinthe range of from 10 watts to 5,000 watts, such as from 10 W to 100 W,100 W to 250 W, 250 W to 1 kW, 1 kW to 2.5 kW, 2.5 kW to 5 kW. Suitablelaser devices 300 will include a laser beam 302 having a wavelength offrom 150 nm to 10.6 μm, for example such as from 150 nm to 375 nm, 375nm to 750 nm, 750 nm to 1,500 nm, and 1,500 nm to 10.6 μm. Inembodiments, the laser devices 300 will be capable of laser pulse widthtypes of one or more of continuous wave (cw), microsecond (μs),nanosecond (ns), picosecond (ps) and femtosecond (fs) pulse types. Anyof these types of lasers may be used alone or in combination as laserdevices 300 of laser systems 120 a-c. In other suitable embodiments, thelaser device 300 is any other laser capable of allowing laser systems120 a-c to perform as described herein.

In some embodiments, the web of base material 104 may include fiducialfeatures 602 that have been machine punched, or laser cut, prior tobeing loaded into production system 100. In another suitable embodiment,the fiducial features 602 may be mechanically machine punchedsubsequently to forming ablations 404 on a first surface of the web ofbase material 104. In other suitable embodiments, the production system100 may include one or more additional mechanical punches which may beused to form one or more of the lengthwise edge cuts 600, and/or thefirst and second perforation 608, 610.

In one embodiment, one or more of the rollers of the conveyor system maynot be perfectly round, such that the roller has an eccentricity. Insuch case, especially if the eccentric roller is a nip roller 112, 123,132, the web of base material 104 may be conveyed in a manner such thata position of the web of base material 104 advances in a mannerdifferently depending upon which portion of the eccentric roller is incontact with the web. For example, if the eccentric roller has a portionof the radius that exceeds the expected radius of the roller, the webmay advance further in the down-web direction WD than expected, when thelarger radius portion of the roller is pushing/pulling the web.Likewise, if the eccentric roller has a reduced radius portion, the webmay advance a reduced distance in the down-web direction WD thanexpected. Accordingly, in one embodiment, the eccentric roller(s) may bemapped to determine the radius versus radial position. The laser system120 a-c may then be controlled to adjust the laser beam 302 position toaccount for the eccentricity based upon the mapping of the roller(s). Inone embodiment, the mapping of the rollers may be stored in the memoryof the user interface 116.

Upon having exited one or more of laser systems 120 a-c, the web of basematerial 104 may be conveyed to one or more cleaning stations such asbrushing station 124 and air knife 126. In one suitable embodiment, thebrushing station 124 includes a brush 1000 (FIGS. 10 and 11 ) thattravels in the cross-web direction XWD. The brush 1000 includes a set ofbristles 1002 that are held by bristle holder 1004. The brush 1000 isconfigured to allow bristles 1002 to delicately contact a surface of theweb of base material 104 and remove or dislodge any debris therefrom.The contact pressure of the bristles 1002 on the surface of the web ofbase material 104 must be low enough that it does not break, rupture orotherwise cause defects in the individual electrode patterns 800, andmaintains the individual electrode patterns 800 as attached to the webof base material 104. In one embodiment, the normal force between thebristles 1002 and the surface of the web of base material 104 is from 0to 2 lbs, such as 0.1 lbs, 0.2 lbs, 0.3 lbs, 0.4 lbs, 0.5 lbs, 0.6 lbs,0.7 lbs, 0.8 lbs, 0.9 lbs, 1.0 lbs, 1.1 lbs, 1.2 lbs, 1.3 lbs, 1.4 lbs,1.5 lbs, 1.6 lbs, 1.7 lbs, 1.8 lbs, 1.9 lbs or 2.0 lbs. In otherembodiments, the normal force may be greater than 2.0 lbs.

In one embodiment, the length of the bristles 1002 is ¾ inch (19.05 mm).In one embodiment, the bristles 1002 are inserted or clamped withinbristle holder 1004 by approximately ⅛ inch. The diameter of thebristles 1002 may be from 0.003 inch (0.076 mm) to 0.010 inch (0.254mm), such as 0.003 inch (0.076), 0.004 inch (0.101 mm), 0.005 inch(0.127 mm), 0.006 inch (0.152 mm), 0.007 inch (0.177 mm), 0.008 inch(0.203 mm), 0.009 inch (0.228 mm) and 0.010 inch (0.254 mm). In onesuitable embodiment, the bristles 1002 are nylon bristles. However, inother embodiments the bristles 1002 may be any other natural orsynthetic material that allows the brush 1000 to function as describedherein.

With further reference to FIGS. 10 and 11 , in one suitable embodiment,to effect movement of the brush 1000 in the cross-web direction XWD, thebrush 1000 is connected to crank arm 1006 via a rotatable coupling 1008,such as a bearing, bushing or the like. The crank arm 1006 is rotatablycoupled to drive wheel 1010 via a second rotatable coupling 1012. Thesecond rotatable coupling 1012 is coupled to a position off center ofthe drive wheel 1010, such that the crank arm 1006 oscillates the brush1000 in a back-and-forth motion in the cross-web direction XWD. Thedrive wheel 1010 is coupled to a motor 1014 to effect rotation of thedrive wheel 1010. A position sensor 1016 senses the position of a brushposition marker 1018, which is coupled to the drive wheel 1010.Accordingly, the position sensor 1016 may measure the phase (e.g.,angular position) and rotations per time of the drive wheel 1010. In oneembodiment, the drive wheel 1010 is controlled to be within a range of 0to 300 rotations per minute (“rpm”) (e.g., 0 to 300 strokes per minuteof brush 1000), such as 0 rpm, 25 rpm, 50 rpm, 75 rpm, 100 rpm, 125 rpm,150 rpm, 175 rpm, 200 rpm, 225 rpm, 250 rpm, 275 rpm and 300 rpm. Inother embodiments, the rpm of drive wheel 1010 may be greater than 300rpm. It is noted that a constant rpm of drive wheel 1010 will cause asinusoidal speed variation of brush 1000, due to the crank arm 1006connection to drive wheel 1010.

In one suitable embodiment, a second brush (not shown) is located in aposition to contact the opposing surface of the web of base material104. In this embodiment, the second brush, which may be substantiallythe same as the first brush 1000 is configured to travel in a directionopposite to the first brush, and suitably 180 degrees out of phase withthe first brush. The phase of the first brush and the second brush maybe determined via the position sensor 1016, and an equivalent positionsensor of the second brush. In this embodiment, the contact pressure ofthe bristles 1002 of the first brush 1000 and the second brush,together, must be low enough that it does not break, rupture orotherwise cause defects in the individual electrode patterns 800, andmaintains the individual electrode patterns 800 as attached to the webof base material 104.

In one embodiment, the brush 1000 has a brush width 1022 that is widerin the cross-web direction XWD than the width of web of base material104 in the cross-web direction XWD. For example, in one embodiment, thebrush width 1022 is of sufficient width that as the brush 1000oscillates in the cross-web direction XWD, the bristles 1002 remain incontact with the full width of the surface of the web of base material104 throughout the entire range of motion of the brush 1000. The rate ofoscillation of the brush 1000 and the pressure exerted by the bristles1002 against the surface of the web of base material 104 may becontrolled by the user using the user interface 116.

The brushing station 124 may be equipped with a vacuum system configuredto create a vacuum through brush station orifices 1020 to evacuatedebris that has been brushed from one or more surfaces of the web ofbase material 104. In this embodiment, the debris may be brushed fromthe web of base material 104 and fall, or be suctioned through the brushstation orifices 1020. The brush station orifices 1020 are illustratedas being round, but may be any shape that allows brushing station 124 tofunction as described herein. Further, the upper edges of the brushstation orifices 1020 may be chamfered, and/or staggered in position toallow the web of base material 104 to more easily pass over them withouthaving an edge of the web of base material 104 get snagged thereon. Inone embodiment, the vacuum level may be controlled to be from 0 to 140inches H₂O, such as 0 in H₂O, 10 in H₂O, 20 in H₂O, 30 in H₂O, 40 inH₂O, 50 in H₂O, 60 in H₂O, 70 in H₂O, 80 in H₂O, 90 in H₂O, 100 in H₂O,110 in H₂O, 120 in H₂O, 130 in H₂O, and 140 in H₂O. In some embodiments,the flow rate of the vacuum is controlled to be from about 0 to 425cubic feet per minute (“cfm”), such as 0 cfm, 25 cfm, 50 cfm, 75 cfm,100 cfm, 125 cfm, 150 cfm, 175 cfm, 200 cfm, 225 cfm, 250 cfm, 275 cfm,300 cfm, 325 cfm, 350 cfm, 375 cfm, 400 cfm and 425 cfm. In otherembodiments, the vacuum level and flow rate may be greater than 140 inH₂O and 425 cfm, respectively. The vacuum level and flow rate arecontrolled to be within a range such that debris is pulled away from theweb of base material 104 without creating unnecessary friction betweenthe web of base material 104 and the conveying system components. Suchvacuum levels and flow rates are, in some embodiments, applicable to allother components of the system using a vacuum.

In another suitable embodiment, one or more of the first brush and thesecond brush may include a load sensor that measures or monitors thepressure the brush is exerting upon the web of electrode material 802.As shown in FIG. 8 , the web of electrode material 802 refers to the webafter having been processed as described herein, such that a populationof individual electrode patterns 800 have been formed therein. In thisembodiment, the first brush and the second brush may be controlled, viauser interface 116, to maintain a uniform brushing pressure on the webof electrode material 802 based upon variations in brush bristle wear orelectrode thickness or surface roughness.

In another suitable embodiment, one or more of the first brush and thesecond brush are configured to move at least partially in the down-webdirection WD at a rate of speed substantially equivalent to the rate ofspeed of the web of electrode material 802, thus maintaining asubstantially zero speed differential between the brush 1000 and the webof electrode material 802 in the down-web direction WD.

In yet another suitable embodiment, the brushing station 124 may beequipped with a position sensor 1016 to determine the phase of the firstbrush and the second brush. In one such embodiment, the position sensor1016 may measure the location of a brush position marker 1018 of thefirst brush and the second brush. In this embodiment, the positionsensor 1016 determines whether the first and second brushes are within arange of predetermined phase difference, such as 180 degrees out ofphase, 90 degrees out of phase or zero degrees out of phase or any othersuitable phase difference that allows the production system 100 tofunction as described herein. As used herein, the “phase” of a brushrefers to an angular position of a brush, such that the bristles of twoseparate brushes would be aligned when “in phase.”

In still another embodiment, an ultrasonic transducer (not shown) may beconfigured to impart ultrasonic vibrations to one or more of the firstand second brushes to facilitate debris removal from the web ofelectrode material 802.

With further reference to FIG. 2 , in one suitable embodiment, the webof base material 104 is conveyed through an air knife 126. As usedherein, the term air knife refers to a device that uses high pressureair that is blown at the web of base material 104. The high pressure aircontacts the surface of the web of base material 104 and removes debristherefrom. The air knife 126 is controlled to supply air at apressure/velocity such that it does not break, rupture or otherwisecause defects in the individual electrode patterns 800, and maintainsthe individual electrode patterns 800 as attached to the web of basematerial 104. In another embodiment, a second air knife (not shown),similar to air knife 126 is configured to blow air at an opposingsurface of the web of base material 104 and remove debris therefrom. Inthis embodiment, the second air knife may blow air in the same directionas the first air knife 126, or in a direction opposite the first airknife 126, or any other direction that allows the air knife 126 tofunction as described herein. In one embodiment, the air knife 126station is equipped with a vacuum that facilitates removal of the debristhat has been removed by the air knife 126.

With reference to FIG. 8 , after having been processed by the lasersystems 120 a-c and cleaned by the brushing station 124 and the airknife 126, the web of base material 104 exits the cleaning stations as aweb containing a plurality of individual electrode patterns 800 withinweb of base material 104, collectively a web of electrode material 802.

With further reference to FIGS. 2, 8 and 12 , in one embodiment, web ofelectrode material 802 passes through inspection station 128. Theinspection station 128 is a device configured to analyze the web ofelectrode material 802 and identify defects thereon. For example, in oneembodiment, the inspection station 128 is a visual inspection deviceincluding a camera 1200, which may be a digital camera such as a digital3-D camera configured to analyze the individual electrode patterns 800on the web of electrode material 802. In one embodiment, the camera 1200is a digital light camera including a CMOS having a 48 megapixelsensitivity. The camera 1200 is optically coupled to a lens 1202, whichmay be a wide field of view lens. In one embodiment, the lens 1202 is atelecentric lens. The lens 1202 is held in place by a lens mount 1204,which in one embodiment may be adjustable in a vertical direction V tocontrol a focus of the lens 1202. The lens 1202 is aimed to focus on theweb of electrode material 802 as it passes over inspection plate 1206.In one embodiment, the inspection plate 1206 includes a transparent orsemi-transparent top 1208 that allows light from a light source (notshown) housed within the inspection plate 1206 to shine therethrough togenerate a backlight. In one suitable embodiment, the intensity and/orcolor of the light may be controlled via the user interface 116. In oneembodiment, one or more additional lighting sources, such as an upstreamlight and a downstream light illuminate the web of electrode material802 while within the inspection station 128. In some embodiments, eachof the lighting sources are independently controllable for intensity andcolor. In one embodiment, the backlight includes a diffuse low anglering light. The web of electrode material 802 may be secured andconveyed over the inspection plate 1206 by gear wheels 1210 that areconfigured to engage the tractor holes 612 of the web of electrodematerial 802. In doing so, the web of electrode material 802 is heldtaught against inspection plate 1206, to substantially eliminate curlingof the web of electrode material 802. Each of the inspection plateleading edge 1214 and the inspection plate trailing edge 1216 may bechamfered (e.g., at angles similar to angle α) to allow the web ofelectrode material 802 to pass smoothly thereover without snagging.

With continued reference to FIG. 12 , in one embodiment, the inspectionstation 128 includes a trigger sensor 1212 that detects a predeterminedfeature of the web of electrode material 802, such as a fiducial feature602, lengthwise edge cut 600 or any other feature that allows inspectionstation 128 to function as described herein. Upon detection of thepredetermined feature, the trigger sensor 1212 sends a signal directlyto camera 1200 or indirectly through the user interface 116, to triggerthe camera 1200 to image an electrode of the web of electrode material802. Upon imaging the electrode, camera 1200 may be configured to detectone or more metrics such as a height of the electrode, a size or shapeof a feature that has been cut by one of the laser systems 120 a-120 c(FIG. 2 ), the pitch (distance) between electrodes or any other featurethat allows the inspection station 128 to function as described herein.For example, in one suitable embodiment, the inspection station 128detects whether the ablations 404 (FIG. 4 ), lengthwise edge cuts 600,fiducial features 602, tractor holes 612, pitch between individualelectrode patterns 800, offset in the cross-web and web direction oftractor holes 612, and first and second perforations 608, 610 (FIG. 6 )are within a predefined tolerance of size, shape, placement andorientation. In one suitable embodiment, a user may control whichfeature to inspect using the user interface 116.

In one embodiment, the web of electrode material 802 is heldsubstantially flat during analysis by the inspection station 128, suchas by use of application of balanced vacuum or fluid (e.g., air) flowover the opposing sides of the web of electrode material 802. In thisembodiment, by having the web of electrode material 802 be flat duringinspection, more precise imaging and analysis may be conducted on theweb of electrode material 802, and thus higher quality error and defectdetection is enabled.

In one embodiment, the inspection station 128 may be configured toprovide in-line metrology of the web of base material 104 and/or web ofelectrode material 802. For example, the inspection station 128 may beconfigured to measure metrics such as web thickness, sizes and shapes ofthe individual electrode patterns 800, and the like while the web isbeing conveyed in the down-web direction WD. These metrics may betransmitted to the user interface 116 for viewing or memory storage, orotherwise used to adjust production parameters of the production system100.

In one embodiment, in the event the inspection station 128 determines adefect is present on the web of electrode material 802 (FIG. 8 ), thedefect marking system 130 (FIG. 2 ) will mark the web of electrodematerial 802 to identify such defect. The defect marking system 130 maybe a laser etching device, printer, stamper or any other marking devicecapable of placing a mark indicating a defect is present on a web ofelectrode material 802. In another suitable embodiment, the defectmarking system 130 is controllable to mark the web of electrode material802 with one or more of an identification number (ID) and known goodelectrodes (KGEs), allowing for the possibility to further mark the webof electrode material 802 with a grade, such as grade A, grade B, gradeC or the like, indicating a quality measurement (such as number or typeof defects) of a particular electrode within the web of electrodematerial 802.

Upon the processing (also referred to as machining) of the web of basematerial 104 into the web of electrode material 802, the web ofelectrode material 802 has a web strength reduction in the down-webdirection WD of from 25 percent to 90 percent as compared to theunprocessed (also referred to as unmachined) web of base material 104.With reference to FIG. 8A, a portion of the web of electrode material802 is shown. In this embodiment, the web of electrode material 802includes electrode clusters EC comprising five individual electrodepatterns 800 separated by a tie bar 614. However, it should beunderstood that in other embodiments, the electrode cluster EC mayinclude any number of individual electrode patterns 800 including one ormore, such as for example, 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14,15, 16, 17, 18, 19, 20 or any other number of individual electrodepatterns 800 between tie bars 614. A distance of electrode cluster widthW_(EC) is defined as a distance in the down-web direction WD between acenter-point of a first individual electrode pattern 800 of an electrodecluster EC to a center-point of a first individual electrode pattern 800in a second electrode cluster EC.

In an exemplary embodiment, the cross-web span of the web S_(W) is 3X mmin the cross-web direction and a width W_(EP) of each individualelectrode pattern 800 in the down-web direction WD is X mm. In thisembodiment, the reduction in web strength of the web of electrodematerial 802 in the down-web direction WD is 33 percent as compared tothe unprocessed web of base material 104. The reduction in web strengthis calculated as the width W_(EP) divided by the cross-web span S_(W)(i.e., X mm/3X mm=0.33).

In another exemplary embodiment, the cross-web span of the web S_(W) is1.5X mm in the cross-web direction and a width W_(EP) of each individualelectrode pattern 800 in the down-web direction WD is 1.3X mm. In thisembodiment, the reduction in web strength of the web of electrodematerial 802 in the down-web direction WD is 87 percent as compared tothe unprocessed web of base material 104. The reduction in web strengthis calculated as W_(EP)/S_(w) (i.e., 1.3X/1.5X=0.87). Web strength ofthe web of electrode material 802 in the down-web direction WD isverified and measured as a breaking strength of the web of electrodematerial 802 using an electromechanical or hydraulic material testerwith at least force feedback, and may include displacement feedback,such as an Instron brand testing machine.

In another exemplary embodiment, there is a strength reduction in thecross-web direction XWD of the web of electrode material 802 as comparedto the web of base material 104. In a first exemplary embodiment, theelectrode cluster width W_(EC) is 6X mm in the down-web direction WD,the width W_(TB) of the tie bar 614 is X mm in the down-web direction WDand the width W_(EP) of the individual electrode pattern 800 is X mm inthe down-web direction WD and the length L_(E) of the individualelectrode pattern 800 is 1.7X mm in the cross-web direction XWD. In thisembodiment, the reduction in strength of the web of electrode material802 in the cross-web direction XWD is about 77 percent as compared tothe unprocessed web of base material 104. In another exemplaryembodiment, the electrode cluster width W_(EC) is 10X mm, the width Wmof the tie bar 614 is 0X mm (i.e., no tie bar 614) and the width W_(EP)of the individual electrode patterns 800 is 2X mm and the length L_(E)of the individual electrode pattern 800 is 1.7X mm. In this embodiment,the reduction in strength of the web of electrode material 802 in thecross-web direction XWD is about 92 percent as compared to theunprocessed web of base material 104. Web strength in the cross-webdirection XWD is verified and measured as a breaking strength of the webof electrode material 802 using an electromechanical or hydraulicmaterial tester with at least force feedback, and may includedisplacement feedback, such as an Instron brand testing machine.

With further reference to FIG. 9 , the web of electrode material 802 isthen conveyed to the rewind roller 134, where it is wound together witha web of interleaf material 138 to create a spool 900 having alternatinglayers of web of electrode material 802 and web of interleaf material138.

In one suitable embodiment, the user interface 116 may include aprocessor and memory configured to store and execute instructionscausing the production system 100 to function as described herein. Theuser interface 116 may further include a display device, such as a LCDor LED display and a set of controls, or virtual controls, that allow auser to control and adjust parameters of the production system 100, aswell as view metrics such as web conveyance speed, tension, number ofdefects, and any other parameters that allow production system 100 tofunction as described herein.

In use, with reference to FIG. 2 , the base unwind roller 102 ofproduction system 100 is loaded with a web of base material 104. The webof base material 104 is passed across an edge guide 106, to facilitateunwinding of the web of base material 104. In this embodiment, the webof base material 104 is then passed around the idler 108 a and into thesplicing station 110. The idler 108 a is used to facilitate maintainingproper positioning and tension of the web of base material 104, as wellas to change the direction of the web of base material 104. The idler108 a receives the web of base material 104 in the vertical direction,and the web of base material 104 is partially wrapped around the idler108 a such that the web of base material 104 leaves the idler 108 a inan output direction substantially ninety degrees from the inputdirection. However, it should be appreciated that the input and outputdirections may vary without departing from the scope of this disclosure.In some embodiments, the production system 100 may use multiple idlers108 a-108 x to change the direction of the web of base material 104 oneor more times as it is conveyed through the production system 100. Inthis embodiment, the user unwinds the web of base material 104 throughthe idlers 108 a-108 x, for example as shown in FIG. 2 .

In one embodiment, the splicing station 110 is used to splice twoseparate webs together. In this embodiment, a first web of base material104 is unwound, such that a trailing edge (not shown) of the first webof base material 104 is stopped within the splicing station 110, and aleading edge (not shown) of a second web of base material 104 is unwoundinto the splicing station 110 such that the trailing edge of the firstweb and the leading edge of the second web are adjacent one another. Theuser then applies an adhesive, such as an adhesive tape, glue, or othersuitable adhesive to join the leading edge of the second web to thetrailing edge of the first web to form a seam between the two webs andcreate a continuous web of base material 104. Such process may berepeated for numerous webs of base material 104, as dictated by a user.

In one suitable embodiment, upon exiting the splicing station 110, theweb of base material 104 is conveyed in the down-web direction WD to thenip roller 112. The nip roller 112 is controlled via user interface 116to adjust/maintain the speed at which the web of base material 104 isconveyed through the production system 100. The web of base material 104is pressed against each of the two adjacent rollers 114 of nip roller112, with enough pressure to allow friction of the rollers to move theweb of base material 104, but a low enough pressure to avoid anysignificant deformation or damage to the web of base material 104.

In one embodiment, during use, the speed of the web of base material 104is controlled by controlling the rate of rotation of the high frictionroller of nip roller 112 via user interface 116. In other embodiments,the production system 100 may include one or more additional nip rollers122, 132 to facilitate control of the speed of the web of base material104, and the web of base material 104 is conveyed therethrough. In thisembodiment, the speed of the additional nip rollers 122, 132 may becontrolled via user interface 116. In use, when multiple nip rollers112, 122, 132 are used, each of the speed of each of the nip rollers112, 122, 132 may be set via user interface 116 to the same speed, ordifferent speeds as required, such that the web of base material 104 isconveyed smoothly through production system 100.

In use, in one embodiment, the web of base material 104 is unwoundthrough the dancer 118. In this embodiment, the pair of rollers of thedancer 118 rotates about the central axis thereof, to passively adjustthe tension on the web of base material 104.

With further reference to FIG. 2 , in use the web of base material 104is conveyed through one or more laser systems 120 a, 120 b, 120 c. Theembodiment shown in FIG. 2 includes three laser systems 120 a-c, but itshould be appreciated that any number of laser systems 120 may be usedto allow the production system 100 to function as described herein.

Use of the production system 100 is further described with additionalreference to FIG. 2-6 . The web of base material 104 is conveyed throughthe laser systems 120 a-c in the down-web direction WD. In oneembodiment, the web of base material 104 is conveyed into laser system120 a in the first condition 400, having not yet been ablated or cut.The web of base material 104 is conveyed over chuck 306, and thus overthe plurality of vacuum holes 406. The vacuum holes 406 are in fluidconnection with vacuum 308, and vacuum 308 is controlled via userinterface 116 to draw a vacuum pressure on the web of base material 104passing over the vacuum holes 406. The vacuum pressure is controlled tomaintain the web of base material 104 in a substantially flat/planarstate as it is conveyed across chuck 306. In one embodiment of use, thevacuum pressure through vacuum holes 406 is monitored and adjusted inreal time, via user interface 116, to ensure that the web of basematerial 104 remains substantially flat across chuck 306 and does notlift or buckle while being processed.

With reference to FIG. 4 , the web of base material 104 is conveyed overthe opening 410 of chuck 306, and further over the chamfer 416 on thedownstream edge 414. In this embodiment, the chamfer 416 facilitates theweb of base material 104 passing over downstream edge 414 without havingthe web of base material 104 catch or snag on the downstream edge 414.

With further reference to FIGS. 3-5 , in one embodiment of use, the webof base material 104 is ablated by laser beam 302 (FIG. 3 ) to createthe ablations 404 (FIG. 4 ) in the web of base material 104. In oneembodiment, the web of base material 104 is anode material 502, and theablations 404 remove the anodically active material layer 508 to exposeanode current collector layer 506 (FIG. 5 ). In another embodiment, theweb of base material 104 is cathode material 504, and the ablations 404remove the cathodically active material layer 512 to expose cathodecurrent collector layer 510.

During use, when using the laser system 120 a to make the ablations 404in the web of base material 104, the power of the laser beam 302 iscontrolled via user interface 116 to a level that is capable ofsubstantially completely, or completely, removing the coating layer, butwill not damage or cut through the current collector layer. In use, thelaser beam 302 is controlled, for example via user interface 116, tocreate the ablations 404 while the web of base material 104 is in motionand being conveyed in down-web direction WD. The laser beam 302 iscontrolled such that ablations 404 are created on each lateral side ofthe web of base material 104, as best shown in FIG. 5 . In oneembodiment of use, after making the ablations 404, the laser system 120a is controlled to cut fiducial features 602 in the web of base material104, as described further herein. In some embodiments, multiple lasersare used to each ablate a portion of the web of base material 104 toeach create one or more ablations 404 to increase the throughput of theproduction system 100.

With further reference to FIGS. 2, 3 and 4 , in another stage of use ofthe production system 100, the web of base material 104 is conveyed inthe down-web direction WD toward the cutting area 408 of the lasersystem 120 a. In this embodiment the opening 410 is in fluidcommunication with the vacuum 308, and vacuum 308 is controlled to drawa vacuum pressure on the web of base material 104 as it passes over theopening 410. In another embodiment, a second vacuum is controlled toequalize the pressure on the web of base material 104 opposite the chuck306. In this embodiment, the equalization in pressure is monitored andcontrolled to maintain the web of base material 104 in a substantiallyflat/planar state and at a consistent height as it passes over theopening 410, to facilitate focus of laser beam 302 on the web of basematerial 104.

In one embodiment of use, the laser system 120 a is controlled to cutone or more patterns in the web of base material 104 while the web ofbase material 104 is over the opening 410. With reference to FIG. 6 ,the laser system 120 is controlled to cut one or more lengthwise edgecuts 600 to define lengthwise edges of an electrode in the cross-webdirection XWD. The lengthwise edge cuts 600 are cut using laser beam 302by cutting the web of base material 104 in the cross-web direction XWDwhile the web of base material 104 is conveyed in the down-web directionWD. For example, in one embodiment, the path motion of laser beam 302 iscontrolled and/or synchronized with the motion of the web of basematerial 104 in the down-web direction WD. Accordingly, the path of thelaser beam 302 travels at an angle with respect to the down-webdirection WD, to account for the movement of the web of base material104 in the down-web direction WD. In this embodiment, a compensationfactor is applied to the path of the laser beam 302 to allow cuts to bemade in the cross-web direction XWD while the web of base material 104is continuously traveling in the down-web direction WD. In thisembodiment, as the web of base material 104 moves in the down-webdirection WD, the laser beam 302 is projected onto the web of basematerial 104 at an initial cut location 604, and then is controlled totravel in both the cross-web direction XWD and the down-web direction WDuntil reaching end cut location 606 to create the lengthwise edge cuts600. It should be appreciated that the angle at which the laser beam 302is controlled to travel varies based upon the speed of the web of basematerial 104 in the down-web direction WD. In another embodiment, theweb of base material 104 is temporarily stopped during the laserprocessing operation, and as such, the path of the laser beam 302 doesnot need to account for the motion of travel of the web of base material104. Such embodiment may be referred to as a step process, or step andrepeat process. During laser processing, one or more of the lasersystems 120 a-c use a repeating alignment feature, such as fiducialfeatures 602 to adjust and/or align the laser beam 302 during the laserprocessing operations, for example to compensate for possible variationsin positioning of the web of base material 104.

With further reference to FIG. 6 , in one embodiment of use, the lasersystem 120 a is controlled to cut one or more of the repeating alignmentfeatures such as a plurality of fiducial features 602 in the web of basematerial 104. The fiducial features 602 are cut at a predetermined/knownlocation on the web of base material 104. In one embodiment of use, thefiducial features 602 are tracked by one or more of the visualinspection devices 310, 312 to measure the location and speed of travelof the web of base material 104. The measurement of the fiducialfeatures 602 is then used to accurately maintain front to back alignmentof the patterns on the web of base material 104 in both the down-webdirection WD and cross-web direction XWD. In some embodiments of use,the laser system 120 a cuts the plurality of tractor holes 612 and/orfiducial features 602. In other embodiments, the fiducial features 602have been pre-formed into the web of base material 104 such that one ormore of laser systems 120 a-c uses them for positioning/alignment asdescribed above.

With reference to FIGS. 2 and 6 , in one suitable embodiment of use, thelaser system 120 a is controlled to cut a first perforation 608 and asecond perforation 610 in the web of base material 104 as part of theindividual electrode pattern 800 as the web of base material 104 is inmotion in the down-web direction WD. First perforation 608 is formed bylaser cutting using laser beam 302, while the web of base material 104is positioned over the opening 410 in chuck 306. The first perforation608 is formed as a linear slit (e.g., through-cut) in a directionaligned with the down-web direction WD. Importantly, the firstperforation 608 is cut such that it does not extend across the entiretyof the width of the electrode W_(E). Instead, the laser system 120 a iscontrolled to cut the patterns such that outer tear strips 700 remain onboth the upstream and downstream edges of the first perforation 608, toensure the individual electrode pattern 800 remains connected to the webof base material 104.

With further reference to FIGS. 6 and 7 , in use, the secondperforations 610 are cut inboard (in the cross-web direction XWD) fromthe first perforations 608. In this embodiment of use, secondperforations 610 are cut as a line of slits in the down-web direction WDseparated by inner tear strips 702. In the embodiment shown, the secondperforations 610 are cut to intersect through holes 704. In theillustrated embodiment, the inner tear strips 702 are cut to be at leasttwo times the length of outer tear strips 700, but may be cut atdifferent lengths as to allow the production system 100 to function asdescribed herein.

In use, with reference to FIGS. 3, 4 and 6 , debris from the laser cutsfor the lengthwise edge cuts 600, the fiducial features 602, and thefirst and second perforations 608, 610 over the opening 410 of the chuck306, is allowed to fall through the opening 410 and the vacuum 308 iscontrolled to collect debris formed during the laser cutting process.

In one suitable embodiment of use, the laser system 120 a is configuredas a first ablation station. In this embodiment, the laser system 120 ais controlled to form the ablations 404, as described above on a firstsurface of the web of base material 104. Upon exiting laser system 120a, the web of base material 104 is conveyed over idler 108 d to flip theweb of base material 104 in a manner such that a second surface(opposing the first surface) of the web of base material 104 ispositioned for processing by the laser system 120 b. In this embodiment,laser system 120 b is configured as a second ablation station and usesthe fiducial features 602 to ensure alignment of the ablations 404 inthe down-web direction WD and cross-web direction XWD. Accordingly, thelaser system 120 b is controlled to perform a second ablation process onthe opposing surface of the web of base material 104, such thatablations 404 on each surface of the web of base material 104 arealigned in the down-web direction WD and the cross-web direction XWD.

In one embodiment of use, the laser system 120 c shown in FIG. 2 isconfigured as a laser cutting station. In this embodiment, the lasersystem 120 c is controlled to perform the laser cuts for lengthwise edgecuts 600, and the first and second perforations 608 and 610.

With further reference to FIGS. 2, 10 and 11 , in one embodiment of use,the web of base material 104 is then conveyed through one or morecleaning stations, such as brushing station 124 and air knife 126 uponhaving exited one or more of laser systems 120 a-c. In one suitableembodiment of use, the web of base material 104 is conveyed throughbrushing station 124, and bristles 1002 are controlled to delicatelycontact a surface of the web of base material 104 and remove or dislodgeany debris therefrom. The contact pressure of the bristles 1002 on thesurface of the web of base material 104 is controlled to be low enoughthat it does not break, rupture or otherwise cause defects in theindividual electrode patterns 800, and maintains the individualelectrode patterns 800 as attached to the web of base material 104.

With further reference to FIGS. 10 and 11 , in one suitable embodimentof use, brush 1000 is controlled to move in the cross-web direction XWDby controlling the motor 1014 to effect rotation of the drive wheel1010. A position sensor 1016 is controlled to sense the position of thebrush position marker 1018 to measure the phase (e.g., angular position)and rotations per time of the drive wheel 1010.

In one suitable embodiment of use, a second brush (not shown) iscontrolled to contact the opposing surface of the web of base material104. In this embodiment, the second brush, which may be substantiallythe same as the first brush 1000 is controlled to travel in a directionopposite to the first brush 1000, and suitably 180 degrees out of phasewith the first brush 1000. The phase of the first brush 1000 and thesecond brush may be monitored via the position sensor 1016, and anequivalent position sensor of the second brush. In this embodiment, thecontact pressure of the bristles 1002 of the first brush 1000 and thesecond brush, together, is controlled to be low enough that it does notbreak, rupture or otherwise cause defects in the individual electrodepatterns 800, and maintains the individual electrode patterns 800 asattached to the web of base material 104.

In use, the rate of oscillation of the brush 1000 and the pressureexerted by the bristles 1002 against the surface of the web of basematerial 104 may be controlled by the user using the user interface 116.

In one embodiment of use, the brushing station 124 is equipped with avacuum system and controlled to create a vacuum through brush stationorifices 1020 to evacuate debris that has been brushed from one or moresurfaces of the web of base material 104. In this embodiment, the debrisis brushed from the web of base material 104 and falls, or is suctionedthrough the brush station orifices 1020.

In another suitable embodiment of use, one or more of the first brush1000 and the second brush include a load sensor that is measured ormonitored to determine the pressure the brush 1000 is exerting upon theweb of electrode material 802. In this embodiment, the first brush 1000and the second brush are controlled, via the user interface 116, tomaintain a substantially uniform brushing pressure on the web ofelectrode material 802 based upon variations in brush bristle wear orelectrode thickness or surface roughness.

In another suitable embodiment of use, one or more of the first brush1000 and the second brush are controlled to move at least partially inthe down-web direction WD at a rate of speed substantially equivalent tothe rate of speed of the web of electrode material 802, to maintain asubstantially zero speed differential between the brush 1000 and the webof electrode material 802 in the down-web direction WD.

In yet another suitable embodiment of use, the brushing station 124 isequipped with a position sensor 1016 that determines the phase of thefirst brush 1000 and the second brush. In this embodiment, the positionsensor 1016 measures the location of the brush position marker 1018 ofthe first brush 1000 and the second brush. In this embodiment, theposition sensor 1016 determines whether the first and second brushes arewithin a range of predetermined phase difference, such as 180 degreesout of phase, 90 degrees out of phase or zero degrees out of phase orany other suitable phase difference that allows the production system100 to function as described herein, and allows for correction thereofor provides an alert to the user via user interface 116 or other alertdevice that the brushes are not properly phased.

In still another embodiment of use, an ultrasonic transducer (not shown)is activated to impart ultrasonic vibrations to one or more of the firstand second brushes to facilitate debris removal from the web ofelectrode material 802.

With further reference to FIG. 2 , in one suitable embodiment of use,the web of base material 104 is conveyed through an air knife 126. Inthis embodiment, high pressure air is controlled to contact the surfaceof the web of base material 104 to remove debris therefrom. The airknife 126 is controlled, for example via user interface 116, to supplyair at a pressure/velocity such that it does not break, rupture orotherwise cause defects in the individual electrode patterns 800, andmaintains the individual electrode patterns 800 as attached to the webof base material 104. In another embodiment, a second air knife iscontrolled to blow air at an opposing surface of the web of basematerial 104 to remove debris therefrom. In this embodiment, the secondair knife is controlled to blow air in the same direction as the firstair knife 126, or in a direction opposite the first air knife, or anyother direction that allows the air knife 126 to function as describedherein. In another embodiment, the air knife 126 is equipped with avacuum that is controlled to facilitate removal of the debris that hasbeen removed by the air knife 126.

With reference to FIG. 8 , after having been processed by the lasersystems 120 a-c and cleaned by the brushing station 124 and the airknife 126, the web of base material 104 exits the cleaning stations as aweb containing a plurality of individual electrode patterns 800 withinweb of base material 104, collectively the web of electrode material802.

With further reference to FIGS. 2, 8 and 12 , in one embodiment of use,the web of electrode material 802 is conveyed through inspection station128. The inspection station 128 is controlled to analyze the web ofelectrode material 802 and identify defects thereon. For example, in oneembodiment, the inspection station 128 is a visual inspection deviceincluding the camera 1200. The lens 1202 is aimed to focus on the web ofelectrode material 802 as it passes over inspection plate 1206. In oneembodiment of use, the inspection plate 1206 includes the transparent orsemi-transparent top 1208 that allows light from a light source (notshown) housed within the inspection plate 1206 to shine therethrough. Inone suitable embodiment, the intensity and/or color of the light iscontrolled via the user interface 116. In one embodiment of use, the webof electrode material 802 is conveyed over the inspection plate 1206 bygear wheels 1210 that engage the tractor holes 612 of the web ofelectrode material 802. In doing so, the web of electrode material 802is held taught against inspection plate 1206, to substantially eliminatecurling of the web of electrode material 802.

With additional reference to FIG. 12 , in one embodiment of use, theinspection station 128 includes a trigger sensor 1212 that is controlledto detect a predetermined feature of the web of electrode material 802,such as a fiducial feature 602, lengthwise edge cut 600 or any otherfeature that allows inspection station 128 to function as describedherein. Upon detection of the predetermined feature, the trigger sensor1212 sends a signal directly to camera 1200 or indirectly through theuser interface 116, to trigger the camera 1200 to image an electrode ofthe web of electrode material 802. Upon imaging the electrode, camera1200 is controlled to detect one or more metrics such as a height of theelectrode, a size or shape of a feature that has been cut by one of thelaser systems 120 a-120 c (FIG. 2 ), the pitch (distance) betweenelectrodes or any other feature that allows the inspection station 128to function as described herein. For example, in one suitableembodiment, the inspection station 128 is controlled to detect whetherthe ablations 404 (FIG. 4 ), lengthwise edge cuts 600, fiducial features602, and first and second perforations 608, 610 (FIG. 6 ), individualelectrode structure cross-web direction XWD dimensions, individualelectrode structure down-web direction WD dimensions, individualelectrode active area offset, and any other ablation or cut of web ofelectrode material 802 are within a predefined tolerance of size, shape,placement, cross-machine direction pitch, machine direction pitch, andorientation, and presents this information to the user via userinterface 116. In one suitable embodiment, a user may control whichfeature to inspect using the user interface 116. In yet anotherembodiment, inspection station 128 may detect a cluster identificationcode for one or more electrode structures of the web of electrodematerial 802.

In one embodiment of use, the inspection station 128 is used to providein-line metrology of the web of base material 104 and/or web ofelectrode material 802. In this embodiment, the inspection station 128is controlled to measure metrics such as web thickness, sizes and shapesof the individual electrode patterns 800, and the like while the web isbeing conveyed in the down-web direction WD. These metrics aretransmitted to the user interface 116 for viewing or memory storage, orotherwise used to adjust production parameters of the production system100.

In one embodiment of use, if the inspection station 128 determines adefect is present on the web of electrode material 802 (FIG. 8 ), thedefect marking system 130 (FIG. 2 ) is controlled to mark the web ofelectrode material 802 to identify such defect using a laser etchingdevice, printer, stamper or any other marking device capable of placinga mark indicating a defect is present on a web of electrode material802. In another suitable embodiment of use, the defect marking system130 is controlled to mark the web of electrode material 802 with one ormore of an identification number (ID) and known good electrodes (KGEs),allowing for the possibility to further mark the web of electrodematerial 802 with a grade, such as grade A, grade B, grade C or thelike, indicating a quality measurement (such as number or type ofdefects) of a particular individual electrode pattern 800 within the webof electrode material 802.

With further reference to FIG. 9 , the web of electrode material 802 isthen conveyed to the rewind roller 134, where it is wound together withweb of interleaf material 138 to create a spool 900 having alternatinglayers of web of electrode material 802 and web of interleaf material138.

In one suitable embodiment of use, the web of electrode material 802 isrewound via a rewind roller 134 together with a web of interleafmaterial 138, which is unwound via interleaf roller 136 to create a rollof electrodes 140 with layers of webs of electrode material 802separated by webs of interleaf material 138. In some embodiments, theweb of electrode material 802 is rewound via the rewind roller 134without the web of interleaf material 138.

In one embodiment of use, web of base material 104 has an adhesive tapelayer (not shown) adhered to one or both surfaces of the anodicallyactive material layer 508, or cathodically active material layer 512,respectively. In this embodiment, in use, the adhesive layer is removedsubsequent to the ablation and cutting (described above) to removeunwanted material or debris.

In one embodiment of use, one or more of the rollers of the conveyorsystem is not perfectly round, such that the roller has an eccentricity.In such embodiment, the eccentric roller(s) are mapped to determine theradius versus radial position. The laser system 120 a-c is thencontrolled to adjust the laser beam 302 position to account for theeccentricity based upon the mapping of the roller(s).

With reference to FIGS. 14-16 , the web of electrode material 802 isused to produce a battery. In this embodiment, individual spools ofelectrode material 1402, 1404, and 1406A and 1406B are unwound andstacked in an alternating configuration including at least one layer ofcathode 1402 and anode 1404 separated by separator material 1406. Itshould be appreciated that the spools of electrode material 1402, 1404,and 1406A and 1406B have been produced as webs of electrode material 802as described herein. In one suitable embodiment, the spools of electrodematerial 1402, 1404, 1406A, and 1406B are merged into a multi-layerstack 1500. In this embodiment, the multi-layer stack 1500 includesanode current collector layer 506 in the center, anodically activematerial layer 508, electrically insulating separator material 500,cathodically active material layer 512 and cathode current conductorlayer 510 in a stacked formation. Additional stacked layers may bemerged, by alternating layers of spools of anode 1404, separator 1406,and cathode 1402 to form the desired number of layers for multi-layerstack 1500. The layers of multi-layer stack 1500 are aligned usingalignment pins 1600 that are driven through fiducial features 602 (FIG.16B).

In another embodiment, for example for a solid state secondary battery,components of the solid state battery may be stacked (after processingas described herein) in a manner including, in order, a positiveelectrode current collector, an electrode layer comprising an positiveactive electrode material, ionic conductor, binder and electronicconductor), a solid state electrolyte and a negative electrode currentcollector, such as that described in U.S. Pat. No. 9,553,332, referencedabove.

In one embodiment, the multi-layer stack 1500 is then placed in apressurized constraint 1602 having pressure plates 1604, 1606 whichapply pressure to the multi-layer stack 1500 in the directions shown bypressure arrows P. The pressure applied to the multi-layer stack 1500may be adjustable using the user interface 116 to control the pressure Papplied by the pressure plates 1604, 1606 to the multi-layer stack 1500.Once a sufficient pressure P has been applied to the multi-layer stack1500, alignment pins 1600 may be moved in a removal direction R, whichcauses second perforation 610 to rupture along its length, such that theablations 404 (electrode tabs) become the outer edges of multi-layerstack 1500, as shown in FIG. 16C.

After the second perforations 610 have ruptured, the multi-layer stack1500 proceeds to a tab welding station to weld bus bars 1700 and 1702 tothe ablations 404 to form stacked cell 1704. Prior to welding, the busbars 1700, 1702 are placed through the bus bar openings 1608 of therespective electrode. In one embodiment, once the bus bars 1700, 1702have been placed through the bus bar openings 1608, the ablations 404are folded down toward bus bars 1700, 1702 respectively, prior towelding. In this embodiment, bus bar 1700 is a copper bus bar and iswelded to the ablations 404 (anode tabs) of the anode current collectorlayer 506, and bus bar 1702 is an aluminum bus bar and is welded to theablations 404 (cathode tabs) of the cathode current collector layer 510.However, in other embodiments, the bus bars 1700 and 1702 may be anysuitable conductive material to allow battery 1804 to function asdescribed herein. The welds may be made using a laser welder, frictionwelding, ultrasonic welding or any suitable welding method for weldingbus bars 1700, 1702 to the ablations 404. In one embodiment, each of thebus bars 1700 and 1702 are in electrical contact with all of theablations 404 for the anode and cathode, respectively.

Upon formation of the stacked cell 1704, the stacked cell 1704 proceedsto a packaging station 1800. At the packaging station 1800, the stackedcell 1704 is coated with an insulating packaging material, such as amulti-layer aluminum polymer material, plastic, or the like, to form abattery package 1802. In one embodiment, the battery package 1802 isevacuated using a vacuum and filled through an opening (not shown) withan electrolyte material. The insulating packaging material may be sealedaround stacked cell 1704 using a heat seal, laser weld, adhesive or anysuitable sealing method. The bus bars 1700 and 1702 remain exposed, andare not covered by battery package 1802 to allow a user to connect thebus bars 1700 and 1702 to a device to be powered, or to a batterycharger. Once the battery package 1802 is placed on stacked cell 1704,it defines a completed battery 1804. In this embodiment, the completedbattery 1804 is a 3-D lithium ion type battery. In other embodiments,the completed battery 1804 may be any battery type suitable forproduction using the devices and methods described herein.

In one embodiment, each member of the anode population has a bottom, atop, and a longitudinal axis A_(E) (FIG. 7 ). In one embodiment, thelongitudinal axis A_(E) extends in the cross-web direction XWD from thebottom to the top thereof. In an alternative embodiment, thelongitudinal axis A_(E) extends in the down-web direction WD from thebottom to the top thereof. In one embodiment, a member of the anodepopulation is formed from the web of base material 104 being anodematerial 502. Additionally, each member of the anode population has alength (L_(E)) (FIG. 6A) measured along the longitudinal axis (A_(E)) ofthe electrode, a width (W_(E)) measured in a direction that isorthogonal to the longitudinal axis (A_(E)) (e.g., the down-webdirection WD), and a height (H_(E)) (FIG. 6A) measured in a directionthat is orthogonal to each of the directions of measurement of thelength (L_(E)) and the width (W_(E)).

The length (L_(E)) of the members of the anode population members willvary depending upon the energy storage device and its intended use. Ingeneral, however, the members of the anode populations will typicallyhave a length (L_(E)) in the range of about 5 mm to about 500 mm. Forexample, in one such embodiment, the members of the anode populationhave a length (L_(E)) of about 10 mm to about 250 mm. By way of furtherexample, in one such embodiment the members of the anode population havea length (L_(E)) of about 25 mm to about 100 mm.

The width (W_(E)) of the members of the anode population will also varydepending upon the energy storage device and its intended use. Ingeneral, however, each member of the anode population will typicallyhave a width (W_(E)) within the range of about 0.01 mm to 2.5 mm. Forexample, in one embodiment, the width (W_(E)) of each member of theanode population will be in the range of about 0.025 mm to about 2 mm.By way of further example, in one embodiment, the width (W_(E)) of eachmember of the anode population will be in the range of about 0.05 mm toabout 1 mm.

The height (H_(E)) of the members of the anode population will also varydepending upon the energy storage device and its intended use. Ingeneral, however, members of the anode population will typically have aheight (H_(E)) within the range of about 0.05 mm to about 10 mm. Forexample, in one embodiment, the height (H_(E)) of each member of theanode population will be in the range of about 0.05 mm to about 5 mm. Byway of further example, in one embodiment, the height (H_(E)) of eachmember of the anode population will be in the range of about 0.1 mm toabout 1 mm. According to one embodiment, the members of the anodepopulation include one or more first electrode members having a firstheight, and one or more second electrode members having a second heightthat is other than the first. In yet another embodiment, the differentheights for the one or more first electrode members and one or moresecond electrode members may be selected to accommodate a predeterminedshape for an electrode assembly (e.g., multi-layer stack 1500 (FIG. 15)), such as an electrode assembly shape having a different heights alongone or more of the longitudinal and/or transverse axis, and/or toprovide predetermined performance characteristics for the secondarybattery.

In general, members of the anode population have a length (L_(E)) thatis substantially greater than each of its width (W_(E)) and its height(H_(E)). For example, in one embodiment, the ratio of L_(E) to each ofW_(E) and H_(E) is at least 5:1, respectively (that is, the ratio ofL_(E) to W_(E) is at least 5:1, respectively and the ratio of L_(E) toH_(E) is at least 5:1, respectively), for each member of the anodepopulation. By way of further example, in one embodiment the ratio ofL_(E) to each of W_(E) and H_(E) is at least 10:1. By way of furtherexample, in one embodiment, the ratio of L_(E) to each of W_(E) andH_(E) is at least 15:1. By way of further example, in one embodiment,the ratio of L_(E) to each of W_(E) and H_(E) is at least 20:1, for eachmember of the anode population.

In one embodiment, the ratio of the height (H_(E)) to the width (W_(E))of the members of the anode population is at least 0.4:1, respectively.For example, in one embodiment, the ratio of H_(E) to W_(E) will be atleast 2:1, respectively, for each member of the anode population. By wayof further example, in one embodiment the ratio of H_(E) to W_(E) willbe at least 10:1, respectively. By way of further example, in oneembodiment the ratio of H_(E) to W_(E) will be at least 20:1,respectively. Typically, however, the ratio of H_(E) to W_(E) willgenerally be less than 1,000:1, respectively. For example, in oneembodiment the ratio of H_(E) to W_(E) will be less than 500:1,respectively. By way of further example, in one embodiment the ratio ofH_(E) to W_(E) will be less than 100:1, respectively. By way of furtherexample, in one embodiment the ratio of H_(E) to W_(E) will be less than10:1, respectively. By way of further example, in one embodiment theratio of H_(E) to W_(E) will be in the range of about 2:1 to about100:1, respectively, for each member of the anode population.

In one embodiment, a member of the cathode population is formed from theweb of base material 104 being cathode material 504. Referring now toFIG. 6B, each member of the cathode population has a bottom, a top, anda longitudinal axis (A_(CE)) extending from the bottom to the topthereof in the cross-web direction XWD and in a direction generallyperpendicular to the direction in which the alternating sequence ofnegative electrode structures and positive electrode structuresprogresses. Additionally, each member of the cathode population has alength (L_(CE)) measured along the longitudinal axis (A_(CE)) which isparallel to the cross-web direction XWD, a width (W_(CE)) measured inthe down-web direction WD in which the alternating sequence of negativeelectrode structures and positive electrode structures progresses, and aheight (H_(CE)) measured in a direction that is perpendicular to each ofthe directions of measurement of the length (L_(CE)) and the width(W_(CE)).

The length (L_(CE)) of the members of the cathode population will varydepending upon the energy storage device and its intended use. Ingeneral, however, each member of the cathode population will typicallyhave a length (L_(CE)) in the range of about 5 mm to about 500 mm. Forexample, in one such embodiment, each member of the cathode populationhas a length (L_(CE)) of about 10 mm to about 250 mm. By way of furtherexample, in one such embodiment each member of the cathode populationhas a length (L_(CE)) of about 25 mm to about 100 mm.

The width (W_(CE)) of the members of the cathode population will alsovary depending upon the energy storage device and its intended use. Ingeneral, however, members of the cathode population will typically havea width (W_(CE)) within the range of about 0.01 mm to 2.5 mm. Forexample, in one embodiment, the width (W_(CE)) of each member of thecathode population will be in the range of about 0.025 mm to about 2 mm.By way of further example, in one embodiment, the width (W_(CE)) of eachmember of the cathode population will be in the range of about 0.05 mmto about 1 mm.

The height (H_(CE)) of the members of the cathode population will alsovary depending upon the energy storage device and its intended use. Ingeneral, however, members of the cathode population will typically havea height (H_(CE)) within the range of about 0.05 mm to about 10 mm. Forexample, in one embodiment, the height (H_(CE)) of each member of thecathode population will be in the range of about 0.05 mm to about 5 mm.By way of further example, in one embodiment, the height (H_(CE)) ofeach member of the cathode population will be in the range of about 0.1mm to about 1 mm. According to one embodiment, the members of thecathode population include one or more first cathode members having afirst height, and one or more second cathode members having a secondheight that is other than the first. In yet another embodiment, thedifferent heights for the one or more first cathode members and one ormore second cathode members may be selected to accommodate apredetermined shape for an electrode assembly, such as an electrodeassembly shape having a different heights along one or more of thelongitudinal and/or transverse axis, and/or to provide predeterminedperformance characteristics for the secondary battery.

In general, each member of the cathode population has a length (L_(CE))that is substantially greater than width (W_(CE)) and substantiallygreater than its height (H_(CE)). For example, in one embodiment, theratio of L_(CE) to each of W_(CE) and H_(CE) is at least 5:1,respectively (that is, the ratio of L_(CE) to W_(CE) is at least 5:1,respectively and the ratio of L_(CE) to H_(CE) is at least 5:1,respectively), for each member of the cathode population. By way offurther example, in one embodiment the ratio of L_(CE) to each of W_(CE)and H_(CE) is at least 10:1 for each member of the cathode population.By way of further example, in one embodiment, the ratio of L_(CE) toeach of W_(CE) and H_(CE) is at least 15:1 for each member of thecathode population. By way of further example, in one embodiment, theratio of L_(CE) to each of W_(CE) and H_(CE) is at least 20:1 for eachmember of the cathode population.

In one embodiment, the ratio of the height (H_(CE)) to the width(W_(CE)) of the members of the cathode population is at least 0.4:1,respectively. For example, in one embodiment, the ratio of H_(CE) toW_(CE) will be at least 2:1, respectively, for each member of thecathode population. By way of further example, in one embodiment theratio of H_(CE) to W_(CE) will be at least 10:1, respectively, for eachmember of the cathode population. By way of further example, in oneembodiment the ratio of H_(CE) to W_(CE) will be at least 20:1,respectively, for each member of the cathode population. Typically,however, the ratio of H_(CE) to W_(CE) will generally be less than1,000:1, respectively, for each member of the anode population. Forexample, in one embodiment the ratio of H_(CE) to W_(CE) will be lessthan 500:1, respectively, for each member of the cathode population. Byway of further example, in one embodiment the ratio of H_(CE) to W_(CE)will be less than 100:1, respectively. By way of further example, in oneembodiment the ratio of H_(CE) to W_(CE) will be less than 10:1,respectively. By way of further example, in one embodiment the ratio ofH_(CE) to W_(CE) will be in the range of about 2:1 to about 100:1,respectively, for each member of the cathode population.

In one embodiment, anode current collector layer 506 also has anelectrical conductance that is substantially greater than the electricalconductance of the anodically active material layer 508. For example, inone embodiment the ratio of the electrical conductance of anode currentcollector layer 506 to the electrical conductance of the anodicallyactive material layer 508 is at least 100:1 when there is an appliedcurrent to store energy in the device or an applied load to dischargethe device. By way of further example, in some embodiments the ratio ofthe electrical conductance of anode current collector layer 506 to theelectrical conductance of the anodically active material layer 508 is atleast 500:1 when there is an applied current to store energy in thedevice or an applied load to discharge the device. By way of furtherexample, in some embodiments the ratio of the electrical conductance ofanode current collector layer 506 to the electrical conductance of theanodically active material layer 508 is at least 1000:1 when there is anapplied current to store energy in the device or an applied load todischarge the device. By way of further example, in some embodiments theratio of the electrical conductance of anode current collector layer 506to the electrical conductance of the anodically active material layer508 is at least 5000:1 when there is an applied current to store energyin the device or an applied load to discharge the device. By way offurther example, in some embodiments the ratio of the electricalconductance of anode current collector layer 506 to the electricalconductance of the anodically active material layer 508 is at least10,000:1 when there is an applied current to store energy in the deviceor an applied load to discharge the device.

In general, the cathode current collector layer 510 may comprise a metalsuch as aluminum, carbon, chromium, gold, nickel, NiP, palladium,platinum, rhodium, ruthenium, an alloy of silicon and nickel, titanium,or a combination thereof (see “Current collectors for positiveelectrodes of lithium-based batteries” by A. H. Whitehead and M.Schreiber, Journal of the Electrochemical Society, 152(11) A2105-A2113(2005)). By way of further example, in one embodiment, cathode currentcollector layer 510 comprises gold or an alloy thereof such as goldsilicide. By way of further example, in one embodiment, cathode currentcollector layer 510 comprises nickel or an alloy thereof such as nickelsilicide.

The following embodiments are provided to illustrate aspects of thedisclosure, although the embodiments are not intended to be limiting andother aspects and/or embodiments may also be provided.

Embodiment 1. A process for delineating a population of electrodestructures in a web, the web comprising an electrically conductive layerhaving opposing front and back surfaces and an electrochemically activematerial layer on the front surface, the back surface, or on both of thefront and back surfaces, the web having a down-web direction and across-web direction, the down-web and cross-web directions beingorthogonal to each other, the process comprising: controlling a tensionof the web in the down-web direction while forming a series of weakenedtear patterns in the web in the down-web direction, the cross-webdirection, or each of the cross-web and down-web directions thatdelineate members of the electrode structure population withoutreleasing the delineated members from the web, wherein the delineatedmembers are individually bounded, at least in part, by a member of theseries of weakened tear patterns that is adapted to facilitateseparation of delineated members, individually, from the web by anapplication of a force, and forming a series of alignment features inthe web that are disposed in the cross-web or down-web directionrelative to the delineated members, the alignment features being adaptedfor locating delineated members of the electrode structure population,individually, in the web.

Embodiment 2. A process for delineating a population of electrodestructures in a web, the web comprising an electrically conductive layerhaving opposing front and back surfaces and an electrochemically activematerial layer on the front surface, the back surface, or on both of thefront and back surfaces, the web having a down-web direction and across-web direction, the down-web and cross-web directions beingorthogonal to each other, the process comprising: supporting a portionof the web on a support surface, the support surface defining anopening; forming a series of weakened tear patterns in the web in thedown-web direction, the cross-web direction, or each of the cross-weband down-web directions that delineate members of the electrodestructure population without releasing the delineated members from theweb, wherein the delineated members are individually bounded, at leastin part, by a member of the series of weakened tear patterns that isadapted to facilitate separation of delineated members, individually,from the web by an application of a force, and forming a series ofalignment features in the web that are disposed in the cross-web ordown-web direction relative to the delineated members, the alignmentfeatures being adapted for locating delineated members of the electrodestructure population, individually, in the web, wherein at least one ofthe forming the weakened tear patterns and the forming the series ofalignment features is performed on the portion of the web located overan opening of a support surface for supporting the web.

Embodiment 3. A process for delineating a population of electrodestructures or electrode separator structures in a web, the webcomprising a down-web direction, a cross-web direction orthogonal to thedown-web direction, and an electrically insulating layer, the processcomprising: controlling a portion of the web to be laser machined to bewithin about +/−100 microns of a laser focal point of a laser beam,laser machining the portion of the web in at least one of the cross-webdirection and the down web direction to delineate members of theelectrode structure or electrode separator structure population in theweb without releasing the delineated members from the web; and formingan alignment feature in the web that is adapted for locating eachdelineated member of the electrode structure or electrode separatorstructure population in the web.

Embodiment 4. A process for delineating a population of electrodestructures in a web, the web comprising a down-web direction and across-web direction orthogonal to the down-web direction, the processcomprising: machining the web in the cross-web and down-web directionsto form a discontinuous weakened portion to delineate members of theelectrode structure population in the web without releasing thedelineated members from the web, the machined web having a strength of10% to 75% of the strength of unmachined web in the web direction.

Embodiment 5. A process for delineating a population of electrodestructures in a web, the web comprising a down-web direction, across-web direction orthogonal to the down-web direction, anelectrochemically active layer, and an electrically conductive layer,the process comprising: laser machining the web in at least thecross-web direction to delineate members of the electrode structurepopulation in the web without releasing the delineated members from theweb; and forming an alignment feature in the web that is adapted forlocating each delineated member of the electrode structure population inthe web.

Embodiment 6. A process for delineating a population of electrodeseparator structures in a web, the web comprising a down-web direction,a cross-web direction orthogonal to the down-web direction, and anelectrically insulating layer, the process comprising: laser machiningthe web in at least the cross-web direction to delineate members of theelectrode separator structure population in the web without releasingthe delineated members from the web; and forming an alignment feature inthe web that is adapted for locating each delineated member of theelectrode structure population in the web.

Embodiment 7. A process for delineating a population of electrodestructures in a web, the web comprising a down-web direction, across-web direction orthogonal to the down-web direction, anelectrochemically active layer, and an electrically conductive layer,the process comprising: feeding the web to a cutting station; cuttingthe web in at least the cross-web direction at the cutting station todelineate members of the electrode structure population in the webwithout releasing the delineated members from the web; and cuttingalignment features in the web that are adapted for locating eachdelineated member of the electrode structure population in the web.

Embodiment 8. A process for delineating a population of electrodestructures in a web, the web comprising a down-web direction, across-web direction orthogonal to the down-web direction, anelectrochemically active layer, and an electrically conductive layer,the process comprising: feeding the web to a laser cutting system;cutting alignment features into the web using the laser cutting system;establishing a location of the web using at least one of the alignmentfeatures; and performing at least one of a cut action and an ablateaction on the web based on the established location.

Embodiment 9. A process for delineating a population of electrodestructures in a web, the web comprising a down-web direction, across-web direction orthogonal to the down-web direction, anelectrochemically active layer, and an electrically conductive layer,the process comprising: laser machining the web in at least thecross-web direction to delineate members of the electrode structurepopulation in the web by forming a discontinuous weakened portiondefining an outer boundary of each delineated member, without releasingthe delineated members from the web; and forming an alignment feature inthe web that is adapted for locating each delineated member of theelectrode structure population in the web.

Embodiment 10. A process for delineating a population of electrodestructures in a web, the web comprising a down-web direction and across-web direction orthogonal to the down-web direction, the processcomprising: machining the web in the cross-web and down-web directionsto form a discontinuous weakened portion to delineate members of theelectrode structure population in the web without releasing thedelineated members from the web, the machined web having a strength of5% to 30% of the strength of the unmachined web in the cross-webdirection.

Embodiment 11. A web comprising an electrochemically active layer and anelectrically conductive layer, the web having a delineated population ofelectrode structures, each electrode structure of the delineatedpopulation of electrode structures being spaced from an adjacentelectrode structure by a discontinuous cut in the web, the web furthercomprising alignment features adapted for locating each delineatedelectrode structure of the electrode structure population in the web.

Embodiment 12. A web comprising a delineated population of separatorstructures, each separator structure of the delineated population ofseparator structures being spaced from an adjacent separator structureby a discontinuous cut in the web, the web further comprising alignmentfeatures adapted for locating each delineated separator structure of theseparator structure population in the web.

Embodiment 13. A process for delineating a population of electrodestructures in a web, the web comprising a down-web direction, across-web direction orthogonal to the down-web direction, and at leastone of a solid state electrolyte, a negative electrode currentcollector, a positive electrode current collector and an positiveelectrode active material, the process comprising: feeding the web to alaser cutting system; cutting alignment features into the web using thelaser cutting system; establishing a location of the web using at leastone of the alignment features; and performing at least one of a cutaction and an ablate action on the web based on the establishedlocation.

Embodiment 14. A web comprising a solid state electrolyte, the webhaving a delineated population of electrode structures, each electrodestructure of the delineated population of electrode structures beingspaced from an adjacent electrode structure by a discontinuous cut inthe web, the web further comprising alignment features adapted forlocating each delineated electrode structure of the electrode structurepopulation in the web.

Embodiment 15. The process or web of any preceding Embodiment whereinthe series of weakened tear patterns are formed with a laser.

Embodiment 16. The process or web of any preceding Embodiment, whereinthe series of alignment features are formed with a laser.

Embodiment 17. The process or web of any preceding Embodiment, whereinthe series of weakened tear patterns, the series of alignment features,or the series of weakened tear patterns and the series of alignmentfeatures are formed with a laser.

Embodiment 18. The process or web of any preceding Embodiment, whereinthe laser has a laser power within a range of from 10 watts to 5,000watts, is a fiber laser, is capable of laser pulse width types of one ormore of continuous wave (cw), microsecond (μs), nanosecond (ns),picosecond (ps) and femtosecond (fs) pulse types or combinationsthereof.

Embodiment 19. The process or web of any preceding Embodiment, whereinthe electrochemically active material layer is on only one of the frontand back surfaces of the electrically conductive layer.

Embodiment 20. The process or web of any preceding Embodiment, whereinthe electrochemically active material layer is on both of the front andback surfaces of the electrically conductive layer.

Embodiment 21. The process or web of any preceding Embodiment, whereinthe delineated members of the electrode structure population have alength, L_(E), and a height, H_(E), wherein: (i) L_(E) is measured inthe cross-web direction and H_(E) is measured in the down-web directionor (ii) L_(E) is measured in the down-web direction and H_(E) ismeasured in the cross-web direction.

Embodiment 22. The process or web of any preceding Embodiment, whereinthe delineated members of the electrode structure population have alength, L_(E), and a height, H_(E), wherein L_(E) is measured in thecross-web direction and H_(E) is measured in the down-web direction.

Embodiment 23. The process or web of any preceding Embodiment, whereinthe delineated members of the electrode structure population have alength, L_(E), and a height, H_(E), wherein L_(E) is measured in thedown-web direction and H_(E) is measured in the cross-web direction.

Embodiment 24. The process or web of any preceding Embodiment, whereinthe delineated members of the electrode structure population have awidth, W_(E), measured in a direction that is orthogonal to the frontand back surfaces of the web and to the down-web and cross-webdirections.

Embodiment 25. The process or web of any preceding Embodiment, wherein aratio of L_(E) to each of W_(E) and H_(E) is at least 5:1 (that is, theratio of L_(E) to W_(E) is at least 5:1, respectively and the ratio ofL_(E) to H_(E) is at least 5:1, respectively).

Embodiment 26. The process or web of any preceding Embodiment, whereinthe ratio of L_(E) to each of W_(E) and H_(E) is at least 10:1 (that is,the ratio of L_(E) to W_(E) is at least 10:1, respectively and the ratioof L_(E) to H_(E) is at least 10:1, respectively).

Embodiment 27. The process or web of any preceding Embodiment, whereinthe ratio of L_(E) to each of W_(E) and H_(E) is at least 15:1 (that is,the ratio of L_(E) to W_(E) is at least 15:1, respectively and the ratioof L_(E) to H_(E) is at least 15:1, respectively).

Embodiment 28. The process or web of any preceding Embodiment, whereinthe ratio of L_(E) to each of W_(E) and H_(E) is at least 20:1 (that is,the ratio of L_(E) to W_(E) is at least 20:1, respectively and the ratioof L_(E) to H_(E) is at least 20:1, respectively).

Embodiment 29. The process or web of any preceding Embodiment, whereinthe ratio of H_(E) to W_(E) is at least 0.4:1, respectively.

Embodiment 30. The process or web of any preceding Embodiment, whereinthe ratio of H_(E) to W_(E) is at least 2:1, respectively.

Embodiment 31. The process or web of any preceding Embodiment, whereinthe ratio of H_(E) to W_(E) is at least 10:1, respectively.

Embodiment 32. The process or web of any preceding Embodiment, whereinthe ratio of H_(E) to W_(E) is at least 20:1, respectively.

Embodiment 33. The process or web of any preceding Embodiment, whereinthe ratio of H_(E) to W_(E) is less than 1,000:1, respectively.

Embodiment 34. The process or web of any preceding Embodiment, whereinthe ratio of H_(E) to W_(E) is less than 500:1, respectively.

Embodiment 35. The process or web of any preceding Embodiment, whereinthe ratio of H_(E) to W_(E) is less than 100:1, respectively.

Embodiment 36. The process or web of any preceding Embodiment, whereinthe ratio of H_(E) to W_(E) is less than 10:1, respectively.

Embodiment 37. The process or web of any preceding Embodiment, whereinthe ratio of H_(E) to W_(E) is within a range of about 2:1 to about100:1, respectively.

Embodiment 38. The process or web of any preceding Embodiment, whereinL_(E) is within a range of about 5 mm to about 500 mm.

Embodiment 39. The process or web of any preceding Embodiment, whereinL_(E) is within a range of about 10 mm to about 250 mm.

Embodiment 40. The process or web of any preceding Embodiment, whereinL_(E) is within a range of about 25 mm to about 100 mm.

Embodiment 41. The process or web of any preceding Embodiment, whereinW_(E) is within a range of about 0.01 mm to 2.5 mm.

Embodiment 42. The process or web of any preceding Embodiment, whereinW_(E) is within a range of about 0.025 mm to about 2 mm.

Embodiment 43. The process or web of any preceding Embodiment, whereinW_(E) is within a range of about 0.05 mm to about 1 mm.

Embodiment 44. The process or web of any preceding Embodiment, whereinH_(E) is within a range of about 0.05 mm to about 10 mm.

Embodiment 45. The process or web of any preceding Embodiment, whereinH_(E) is within a range of about 0.05 mm to about 5 mm.

Embodiment 46. The process or web of any preceding Embodiment, whereinH_(E) is within a range of about 0.1 mm to about 1 mm.

Embodiment 47. The process or web of any preceding Embodiment, whereinthe electrically conductive layer has an electrical conductivity of atleast 10³ Siemens/cm.

Embodiment 48. The process or web of any preceding Embodiment, whereinthe electrically conductive layer has an electrical conductivity of atleast about 10⁴ Siemens/cm.

Embodiment 49. The process or web of any preceding Embodiment, whereinthe electrically conductive layer has an electrical conductivity of atleast about 10⁵ Siemens/cm.

Embodiment 50. The process or web of any preceding Embodiment, whereinthe electrically conductive layer comprises a material suitable for useas a positive electrode current collector layer.

Embodiment 51. The process or web of any preceding Embodiment, whereinthe electrically conductive layer comprises aluminum, carbon, chromium,gold, nickel, nickel phosphorous (NiP), palladium, platinum, rhodium,ruthenium, titanium, an alloy of silicon and nickel (NiSi), or acombination thereof.

Embodiment 52. The process or web of any preceding Embodiment, whereinthe electrochemically active material layer comprises a cathodicallyactive material.

Embodiment 53. The process or web of any preceding Embodiment, whereinthe electrochemically active material layer(s) comprise a transitionmetal oxide, a transition metal sulfide, a transition metal nitride, alithium-transition metal oxide, a lithium-transition metal sulfide, or alithium-transition metal nitride.

Embodiment 54. The process or web of any preceding Embodiment, whereinthe electrochemically active material layer(s) comprise a transitionmetal oxide, a transition metal sulfide, or a transition metal nitridewherein the transition metal has a d-shell or f-shell.

Embodiment 55. The process or web of any preceding Embodiment, whereinthe electrochemically active material layer(s) comprise Sc, Y, alanthanoid, an actinoid, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re,Fe, Ru, Os, Co, Rh, Ir, Ni, Pb, Pt, Cu, Ag, or Au.

Embodiment 56. The process or web of any preceding Embodiment, whereinthe electrochemically active material layer(s) comprise LiCoO₂,LiNi_(0.5)Mn_(1.5)O₄, Li(Ni_(x)Co_(y)Al_(z))O₂, LiFePO₄, Li₂MnO₄, V₂O₅,molybdenum oxysulfides, phosphates, silicates, vanadates, sulfur, sulfurcompounds, oxygen (air), Li(Ni_(x)Mn_(y)Co_(z))O₂, and combinationsthereof.

Embodiment 57. The process or web of any preceding Embodiment, whereinthe electrically conductive layer comprises a material suitable for useas a negative electrode current collector layer.

Embodiment 58. The process or web of any preceding Embodiment, whereinthe electrically conductive layer comprises copper, nickel, cobalt,titanium, or tungsten, or an alloy thereof.

Embodiment 59. The process or web of any of preceding Embodiment whereinthe electrochemically active material layer(s) comprise an anodicallyactive material.

Embodiment 60. The process or web of any of preceding Embodiment whereinthe electrochemically active material layer(s) comprise graphite, a softor hard carbon, or graphene.

Embodiment 61. The process or web of any preceding Embodiment whereinthe electrochemically active material layer(s) comprise single-walled ormulti-walled carbon nanotubes.

Embodiment 62. The process or web of any preceding Embodiment whereinthe electrochemically active material layer(s) comprise single-walledcarbon nanotubes.

Embodiment 63. The process or web of any preceding Embodiment whereinthe electrochemically active material layer(s) comprise a metal, asemi-metal, an alloy, or an oxide or nitride thereof capable of formingan alloy with lithium.

Embodiment 64. The process or web of any preceding Embodiment whereinthe electrochemically active material layer(s) comprise graphite, tin,lead, magnesium, aluminum, boron, gallium, silicon, a Si/C composite, aSi/graphite blend, silicon oxide (SiO_(x)), porous Si, intermetallic Sialloys, indium, zirconium, germanium, bismuth, cadmium, antimony,silver, zinc, arsenic, hafnium, yttrium, lithium, sodium, lithiumtitanate, palladium, or a combination thereof.

Embodiment 65. The process or web of any preceding Embodiment whereinthe electrochemically active material layer(s) comprise aluminum, tin,or silicon, or an oxide thereof, a nitride thereof, a fluoride thereof,or alloy thereof.

Embodiment 66. The process or web of any preceding Embodiment whereinthe electrochemically active material layer(s) comprise silicon or analloy or oxide thereof.

Embodiment 67. The process or web of any preceding Embodiment whereinthe electrically conductive layer comprises a material suitable for useas a negative electrode current collector layer, the electrochemicallyactive material layer(s) comprises an anodically active material and theelectrically conductive layer has an electrical conductance that issubstantially greater than the electrical conductance of the anodicallyactive material layer.

Embodiment 68. The process or web of any preceding Embodiment wherein aratio of the electrical conductance of the electrically conductive layerto the electrical conductance of the anodically active material layer isat least 100:1.

Embodiment 69. The process or web of any preceding Embodiment wherein aratio of the electrical conductance of the electrically conductive layerto the electrical conductance of the anodically active material layer isat least 500:1.

Embodiment 70. The process or web of any preceding Embodiment wherein aratio of the electrical conductance of the electrically conductive layerto the electrical conductance of the anodically active material layer isat least 1,000:1.

Embodiment 71. The process or web of any preceding Embodiment wherein aratio of the electrical conductance of the electrically conductive layerto the electrical conductance of the anodically active material layer isat least 5,000:1.

Embodiment 72. The process or web of any preceding Embodiment wherein aratio of the electrical conductance of the electrically conductive layerto the electrical conductance of the anodically active material layer isat least 10,000:1.

Embodiment 73. The process or web of any preceding Embodiment, whereinthe web is a laminate comprising an electrochemically active layer andan electrically conductive layer.

Embodiment 74. The process or web of any preceding Embodiment, whereinthe electrochemically active layer comprises an anodically activematerial.

Embodiment 75. The process or web of any preceding Embodiment, whereinthe electrochemically active layer comprises a cathodically activematerial.

Embodiment 76. The process or web of any preceding Embodiment, whereinthe laser machining comprises forming a plurality of cuts andperforations through the web.

Embodiment 77. The process or web of any preceding Embodiment, whereinthe machined web has a strength of 10% to 75% of a strength ofunmachined web in the web direction.

Embodiment 78. The process or web of any preceding Embodiment, whereinthe machined web has a strength of 5% to 30% of the strength of anunmachined web in the cross-web direction.

Embodiment 79. The process or web of any preceding Embodiment, whereinthe alignment feature comprises a through-hole extending through theweb.

Embodiment 80. The process or web of any preceding Embodiment, whereinthe laser machining comprises forming a series of outer perforations anda series of inner perforations, the outer perforations having a lowerrupture strength than the inner perforations.

Embodiment 81. The process or web of any preceding Embodiment, whereinthe laser machining comprises ablating an electrode tab area from eachdelineated electrode.

Embodiment 82. The process or web of any preceding Embodiment, furthercomprising laser machining the web in the down-web direction.

Embodiment 83. The process or web of any preceding Embodiment, furthercomprising using information related to the alignment feature toposition a laser beam during the laser machining of the web.

Embodiment 84. The process or web of any preceding Embodiment, whereinthe laser machining comprises controlling a first laser device to lasermachine the web in the cross-web direction and controlling a secondlaser device to laser machine the web in the down-web direction.

Embodiment 85. The process or web of any preceding Embodiment, furthercomprising applying a vacuum to the web during the laser machining ofthe web.

Embodiment 86. The process or web of any preceding Embodiment, furthercomprising using a sensor to detect defects in the delineated members.

Embodiment 87. The process or web of any preceding Embodiment, furthercomprising using a marking device to mark the web in a manner toindicate a detected defect in the delineated member.

Embodiment 88. The process or web of any preceding Embodiment, furthercomprising laser machining a tie bar between groupings of the delineatedmembers.

Embodiment 89. The process or web of any preceding Embodiment, whereinthe tie bar is defined by laser machined cuts in the cross-webdirection.

Embodiment 90. The process or web of any preceding Embodiment, furthercomprising applying a tension to the web in the cross-web directionprior to the laser machining.

Embodiment 91. The process or web of any preceding Embodiment, whereinthe alignment features are formed at a location distal to the delineatedmembers in the cross-web direction.

Embodiment 92. The process or web of any preceding Embodiment, furthercomprising leaving an unmachined portion of the web between thealignment features and an outermost edge of the web in the cross-webdirection.

Embodiment 93. The process or web of any preceding Embodiment, whereinthe unmachined portion extends across an entire length of the web in theweb direction.

Embodiment 94. The process or web of any preceding Embodiment, furthercomprising contacting a rotating brush against the web after the lasermachining.

Embodiment 95. The process or web of any preceding Embodiment, whereinthe laser machining process occurs while the web moves in the down-webdirection.

Embodiment 96. The process or web of any preceding Embodiment, wherein alaser beam is controlled to account for a speed of travel of the web inthe down-web direction during the laser machining.

Embodiment 97. The process or web of any preceding Embodiment, furthercomprising controlling the tension of the web in the down-web directionduring the laser machining.

Embodiment 98. The process or web of any preceding Embodiment, furthercomprising winding the laser machined web with an interleaf layer.

Embodiment 99. The process or web of any preceding Embodiment, furthercomprising conveying the web in the down-web direction after the lasermachining without releasing the delineated members from the web.

Embodiment 100. The process or web of any preceding Embodiment, whereinthere is a one to one ratio of alignment features to delineated members.

Embodiment 101. The process or web of any preceding Embodiment, whereinthe weakened portion comprises a series of through cuts or perforations.

Embodiment 102. The process of any preceding Embodiment, furthercomprising pressure-balancing the web during the forming of thediscontinuous weakened portion.

Embodiment 103. The process or web of any preceding Embodiment, whereinthe pressure-balancing involves application of a fluid flow across theweb.

Embodiment 104. The process or web of any preceding Embodiment, whereinthe pressure-balancing comprises applying a fluid flow across opposingsides of the web.

Embodiment 105. The process or web of any preceding Embodiment, whereinthe alignment feature is formed prior to the laser machining.

Embodiment 106. The process or web of any preceding Embodiment, whereinthe alignment feature is used to aid in the forming of the discontinuousweakened portions.

Embodiment 107. The process or web of any preceding Embodiment, whereinthe support surface comprises aluminum and the support surfacedissipates thermal energy from the laser machining process.

Embodiment 108. The process of web of any preceding Embodiment, whereinthe laser machining is performed on a portion of the web located over anopening of a support surface.

Embodiment 109. The process or web of any preceding Embodiment, whereinthe controlling a portion of the web comprises controlling the web in avertical axis direction substantially parallel to the laser beam.

Embodiment 110. The process or web of any preceding Embodiment, whereinthe support surface comprises a plurality of openings, and the formingthe weakened tear patterns and the forming the series of alignmentfeatures is performed on respective portions of the web located overdifferent ones of the plurality of openings.

Embodiment 111. The process or web of any preceding Embodiment, whereincontrolling the tension of the web comprises maintaining a tension onthe web of 500 gram force or less.

What is claimed is:
 1. A process for delineating a population ofelectrode structures in a web, the web comprising an electricallyconductive layer having opposing front and back surfaces and anelectrochemically active material layer on the front surface, the backsurface, or on both of the front and back surfaces, the web having adown-web direction and a cross-web direction, the down-web and cross-webdirections being orthogonal to each other, the process comprising: laserablating the web to form a series of ablations in the web that aredisposed in the down-web direction or the cross-web direction, eachablation being formed by removing a portion of the electrochemicallyactive layer to thereby expose a portion of the electrically conductivelayer; forming a series of alignment features in the web that aredisposed in the cross-web or down-web direction, the series of alignmentfeatures being formed at predetermined locations on the web; and lasermachining the web to form a series of weakened tear patterns in the webin the down-web direction, the cross-web direction, or each of thecross-web direction and down-web direction that delineate members of theelectrode structure population, each of the delineated members beingindividually bounded, at least in part, by a member of the series ofweakened tear patterns that is adapted to facilitate separation ofdelineated members, individually, from the web by an application of aforce, the series of alignment features being used to aid in theformation of the series of weakened tear patterns.
 2. The process ofclaim 1, further comprising: applying a tension to the web in thecross-web direction prior to the laser machining or to the web in thedown-web direction during the laser machining; and conveying the web inthe down-web direction after the laser machining without releasing thedelineated members from the web.
 3. The process of claim 1, furthercomprising controlling a tension of the web in the down-web directionduring the laser machining.
 4. The process of claim 3, whereincontrolling the tension of the web comprising maintaining a tension onthe web of 500 gram force or less.
 5. The process of claim 1, whereinthe electrochemically active material layer is on only one of the frontand back surfaces of the electrically conductive layer.
 6. The processof claim 1, wherein the electrochemically active material layer is onboth of the front and back surfaces of the electrically conductivelayer.
 7. The process of claim 1, wherein the electrically conductivelayer comprises a material suitable for use as a positive electrodecurrent collector layer or a negative electrode current collector layer.8. The process of claim 7, wherein the electrochemically active materiallayer comprises a cathodically active material or an anodically activematerial.
 9. The process of claim 1, further comprising forming apopulation of tie bars between at least some of the delineated membersof the electrode structure population, each of the tie bars being sizedto provide additional structural stiffness to the web.
 10. The processof claim 9, wherein the web with the delineated members and thepopulation of tie bars has a strength of 10% to 75% of a strength of anunmachined web in the down-web direction and a strength of 5% to 30% ofa strength of the unmachined web in the cross-web direction.
 11. Theprocess of claim 1, wherein the forming the series of alignment featurescomprises laser machining the web after laser ablating to form theseries of ablations.
 12. The process of claim 1, wherein the lasermachining the web to form the series of weakened tear patterns compriseslaser machining a series of outer perforations and a series of innerperforations, the outer perforations having a lower rupture strengththan the inner perforations.
 13. The process of claim 1, furthercomprising conveying the web over a support surface during the lasermachining, the support surface comprising aluminum or an aluminum alloy.14. The process of claim 13, further comprising dissipating thermalenergy from the laser machining using the support surface.
 15. A processfor delineating a population of electrode structures in a web, the webcomprising an electrically conductive layer having opposing front andback surfaces and an electrochemically active material layer on thefront surface, the back surface, or on both of the front and backsurfaces, the web having a down-web direction and a cross-web direction,the down-web and cross-web directions being orthogonal to each other,the process comprising: moving the web over a support surface, thesupport surface comprising a thermally conductive material; forming aseries of alignment features in the web that are disposed in thecross-web or down-web direction; laser machining the web to form aseries of weakened tear patterns in the web in the down-web direction,the cross-web direction, or each of the cross-web direction and down-webdirection that delineate members of the electrode structure population,each of the delineated members being individually bounded, at least inpart, by a member of the series of weakened tear patterns that isadapted to facilitate separation of delineated members, individually,from the web by an application of a force, the series of alignmentfeatures being used to aid in the formation of the series of weakenedtear patterns; and dissipating thermal energy from the laser machiningusing the support surface.
 16. The process of claim 15, furthercomprising laser ablating the web to form a series of ablations in theweb that are disposed in the down-web direction or the cross-webdirection, each ablation being formed by removing a portion of theelectrochemically active layer to thereby expose a portion of theelectrically conductive layer.
 17. The process of claim 15, wherein thelaser machining is performed while the web is moving over the supportsurface.
 18. The process of claim 17, further comprising controlling anangle at which a laser beam travels during the laser machining based ona speed at which the web is moving.
 19. The process of claim 15, furthercomprising controlling a portion of the web to be laser machined to bewithin about +/−100 microns of a laser focal point of a laser beam. 20.The process of claim 15, wherein a laser used for the laser machininghas a laser power within a range of from 10 watts to 5,000 watts, is afiber laser, and is capable of laser pulse width types of one or more ofcontinuous wave (cw), microsecond (μs), nanosecond (ns), picosecond (ps)and femtosecond (fs) pulse types or combinations thereof.
 21. Theprocess of claim 15, wherein the laser machining forms the series ofweakened tear patterns in each of the cross-web direction and down-webdirection, and includes controlling a first laser device to lasermachine the web in the cross-web direction and controlling a secondlaser device to laser machine the web in the down-web direction.
 22. Aprocess for delineating a population of electrode structures in a web,the web comprising an electrically conductive layer having opposingfront and back surfaces and an electrochemically active material layeron the front surface, the back surface, or on both of the front and backsurfaces, the web having a down-web direction and a cross-web direction,the down-web and cross-web directions being orthogonal to each other,the process comprising: forming a series of fiducial through-holes inthe web that are disposed in the cross-web or down-web direction; lasermachining the web form a series of weakened tear patterns in the web inthe down-web direction, the cross-web direction, or each of thecross-web direction and down-web direction that delineate members of theelectrode structure population, wherein the delineated members areindividually bounded, at least in part, by a member of the series ofweakened tear patterns that is adapted to facilitate separation ofdelineated members, individually, from the web by an application of aforce, the series of fiducial through-holes being formed prior to thelaser machining and used to aid in the formation of the series ofweakened tear patterns; controlling a tension in the web in the down-webdirection during the laser machining; and conveying the web in thedown-web direction after the laser machining without releasing thedelineated members from the web.
 23. The process of claim 22, furthercomprising applying a tension to the web in the cross-web directionprior to the laser machining.
 24. The process of claim 22, whereincontrolling the tension of the web comprises maintaining a tension onthe web of 500 gram force or less.
 25. The process of claim 22, furthercomprising tracking the series of fiducial through-holes with one ormore visual inspection devices to measure at least one of a location anda speed of travel of the fiducial through-holes.
 26. The process ofclaim 22, further comprising using a sensor to detect defects in thedelineated members.
 27. The process of claim 26, wherein the sensor istriggered by identifying one of the series of fiducial through-holes orone of the series of weakened tear patterns.
 28. The process of claim26, further comprising using a marking device to mark the web in amanner to indicate a detected defect in one of the delineated members.29. The process of claim 22, further comprising further comprisingpressure-balancing the web during the laser machining.
 30. The processof claim 29, wherein the pressure-balancing comprises applying a fluidflow across opposing sides of the web.